2017
DOI: 10.1088/1757-899x/209/1/012012
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Development and Investigation of Tungsten Copper Sintered Parts for Using in Medium and High Voltage Switching Devices

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Cited by 13 publications
(20 citation statements)
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“…In this aim, uniaxial pressing of elemental powder mixtures, sintering and Cu infiltration of W based skeletons under protective hydrogen and nitrogen atmosphere were performed in modified conditions described by us elsewhere [8]. After Cu excess removing by mechanical polishing, the both circular surfaces of the disk samples were finished to obtain a surface roughness with Ra of 0.10…0.16 µm and Rz of 0.7…1.4 µm.…”
Section: Methodsmentioning
confidence: 99%
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“…In this aim, uniaxial pressing of elemental powder mixtures, sintering and Cu infiltration of W based skeletons under protective hydrogen and nitrogen atmosphere were performed in modified conditions described by us elsewhere [8]. After Cu excess removing by mechanical polishing, the both circular surfaces of the disk samples were finished to obtain a surface roughness with Ra of 0.10…0.16 µm and Rz of 0.7…1.4 µm.…”
Section: Methodsmentioning
confidence: 99%
“…Equipment and testing conditions are detailed in other paper published by us [8]. Mean values of ten measurements performed in ambient air at 30±2 °C and humidity of 32±3% are presented further for hardness (H IT , HV IT ), Young's modulus (E IT ), contact stiffness (S), elastic and plastic behavior of indentation work and creep indentation (C IT ).…”
Section: Methodsmentioning
confidence: 99%
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