Developing novel photoresists: microstructuring of triazene containing copolyester films

Hahn, Ch.; Kunz, Th.; Dähn, U.; Nuyken, Oskar; Wokaun, Alexander

doi:10.1016/s0169-4332(97)00764-2

Cited by 14 publications

(9 citation statements)

References 13 publications

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“…The applications of polyesters, polycarbonates and polyimides containing the photolabile triazene group (Ph-N=N-NR2) in photorersists and XeCl excimer laser ablation were studied by Ch. Hahn et al (1998).…”

Section: Polymers With Azides Moietymentioning

confidence: 99%

A Review on Photopolymers for Polymer Nanocomposite Applications

2014

J. Environ. Nanotechnol.

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Polymer nanocomposites (PNCs) are a class of thermo or thermosetting polymers reinforced with small quantities of nano-sized particles to achieve desirable properties such as high thermal, mechanical and flame retardant properties. The present article focuses the different types of photosensitive polymers employed in the production of polymer nanocomposites for photoresist applications. Polymer nanocomposites having photoresist materials show shape dependent properties due to the presence of various photosensitive moieties which after photoirradiation and processing in the specific areas show appropriate solubility. Advanced synthetic methods geared to the needs of today's photoresist applications in fields such as photolithography, advanced microelectronics, medical fields, photo recorders, liquid crystalline displays, holographic display non-linear optical materials.

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Section: Polymers With Azides Moietymentioning

confidence: 99%

A Review on Photopolymers for Polymer Nanocomposite Applications

2014

J. Environ. Nanotechnol.

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“…In the context of the notable progress made in understanding polymer ablation11 with direct consequences for the structuring of surfaces, the triazene polymers are considered materials of great promise for excimer laser ablation lithography12 as a complementary technique to conventional photolithography. Viewed from this perspective, some polymers with triazene functions (Ph N  N  N ), such as polyesters, polyethers, poly(methyl methacrylate)s (PMMAs), polysulfones, and polytriazenes, have been tested with UV/laser ablation 13–17.…”

Section: Introductionmentioning

confidence: 99%

Synthesis and properties of new photosensitive triazene polyacrylates

Buruiana

Buruiană

Hahui

et al. 2006

J. Polym. Sci. A Polym. Chem.

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1-(Phenyl)-3-(2-acryloyloxyethyl)-3-methyl triazene-1 (M1) and 1-(p-nitrophenyl)-3-(2-acryloyloxyethyl)-3-methyl triazene-1 (M2) were synthesized to study the substituent effect of the triazene unit on the copolymerization with methyl methacrylate (MMA). From the 1 H NMR spectra of the resulting copolymers, their compositions were determined to be 1:3.18 M1/MMA and 1:2.45 M2/MMA, respectively. The polymers were examined with respect to their structure, thermal properties, and surface morphology. The influence of the triazene structure on the photosensitive properties of the copolymers exposed to ultraviolet/laser irradiation was also investigated and compared with that of the parent derivatives. The copolymer containing the phenyl triazene chromophore as the photochemically most active group exhibited a low threshold of ablation and a high etching rate for fluences under 400 mJ cm À2 . Scanning electron microscopy images confirm the formation of ablated craters more clearly in the copolymer made with M1, for which the thermal effects of the ablation mechanism were visible only with 2500Â magnification. V V C 2006 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 44: 5271-5282, 2006 Figure 5. (a) Ultraviolet-visible spectral changes in a polymeric film (T-PAc2) upon UV irradiation and (b) its kinetics. 5278 BURUIANA ET AL.

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“…Such resists must be highly sensitive to high resolution patterning at the irradiation wavelength and should exhibit mechanical, thermal, and chemical stability for all additional manufacturing steps. Triazene containing polymers are suitable candidates for the XeCl excimer laser ablation lithography [1][2][3] due to their high photosensitivity and spontaneous fragmentation into low molecular gaseous products upon irradiation at 308 nm. Different classes of triazene containing polymers like polytriazenes 4 as well as triazene containing polysulfides 5 and polyesters 6 have been synthesized using various preparation methods.…”

Section: Introductionmentioning

confidence: 99%