2010
DOI: 10.1016/j.jnucmat.2010.01.024
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Deuterium trapping in tungsten deposition layers formed by deuterium plasma sputtering

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Cited by 37 publications
(6 citation statements)
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“…However, since the same trend was not noticed for the rest of the layers this is by no means a clear evidence of bias influence upon D retention. Furthermore, the high D retention values obtained in our study for W coatings are similar with the ones found in literature for W layers co-deposited at low temperatures (~300 K) with D using magnetron sputtering [30][31][32] and also with plasma spray W coatings exposed to low energy D plasma [33]. However, the retention levels are higher compared to studies performed on W coatings and polycrystalline W foils exposed to D ions at low fluences, where typical D/W ratio is lower than 0.01.…”
Section: Deuterium Desorption Characteristicssupporting
confidence: 91%
“…However, since the same trend was not noticed for the rest of the layers this is by no means a clear evidence of bias influence upon D retention. Furthermore, the high D retention values obtained in our study for W coatings are similar with the ones found in literature for W layers co-deposited at low temperatures (~300 K) with D using magnetron sputtering [30][31][32] and also with plasma spray W coatings exposed to low energy D plasma [33]. However, the retention levels are higher compared to studies performed on W coatings and polycrystalline W foils exposed to D ions at low fluences, where typical D/W ratio is lower than 0.01.…”
Section: Deuterium Desorption Characteristicssupporting
confidence: 91%
“…Because of the good temperature resolution, and the ability to perform depositions and TDS analyses quickly (up to four analyses per day), it was possible to obtain the most detailed (25 K resolution) temperature dependence of deuterium content in W films in the widest temperature range (from near room temperature up to 800 K) ever measured. This gave the opportunity to observe the step-like shape of the curve, which was previously unseen [31,32]. The new experimental data allowed us to verify a newly developed theoretical model [33] proposed for co-deposition process.…”
Section: Tds From Co-deposited Films With High Melting Temperaturementioning
confidence: 71%
“…Как было установлено в эксперименте, скорость осаждения зависит от угла β: чем больше β, тем больше скорость осаждения. Поэтому представляется возможным изменять скорость осаждения без изменения отношения D/C или D/W в потоке плазмы в отличие от выполненных ранее работ по имитации стационарных процессов ИТЭР, например [3,4]. Модуль разработанной диагностики для измерения скорости осаждения был закреплён в том же месте, что и коллекторы, в этом случае β = 90º (см.…”
Section: исследование продуктов эрозии осаждённых в условиях импульсunclassified
“…Данный факт объясняется тем, что количество осаждённого материала (число атомов) в экспериментах с графитовой мишенью как минимум на порядок выше, чем для экспериментов с вольфрамовой мишенью. Относительные концентрации изотопов водорода такого же уровня наблюдались в экспериментах на установках SCFD и Tore Supra (для С-D-и С-Нплёнок [5]), а также в магнетронных экспериментах (для W [3,4] и смешанных C-W-D-плёнок [16,17]).…”
Section: материалunclassified
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