2022
DOI: 10.1016/j.jnucmat.2022.153671
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Deuterium plasma sputtering of mixed Be-W layers

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Cited by 3 publications
(2 citation statements)
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“…This results in ion acceleration towards the FM with an energy of e(V p − V DC ), where V p is the plasma potential, and leads to sputtering of surface deposits given the ion energy is greater than the sputtering energy threshold of the deposits. Plasma cleaning of FM deposits via CCRF discharges has been a subject of intense investigation in recent years [7][8][9][10].…”
Section: Introductionmentioning
confidence: 99%
“…This results in ion acceleration towards the FM with an energy of e(V p − V DC ), where V p is the plasma potential, and leads to sputtering of surface deposits given the ion energy is greater than the sputtering energy threshold of the deposits. Plasma cleaning of FM deposits via CCRF discharges has been a subject of intense investigation in recent years [7][8][9][10].…”
Section: Introductionmentioning
confidence: 99%
“…They would thus require regular surface conditioning, which is foreseen to be achieved via an in-situ CCRF discharge cleaning system [17]. This system employs FMs as the powered electrodes to generate CCRF discharges, wherein they develop a negative self-bias and undergo ion sputtering [18][19][20][21]. However, Figure 1.…”
Section: Introductionmentioning
confidence: 99%