2016
DOI: 10.1021/acs.macromol.6b00987
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Determining the Effective Density and Stabilizer Layer Thickness of Sterically Stabilized Nanoparticles

Abstract: A series of model sterically stabilized diblock copolymer nanoparticles has been designed to aid the development of analytical protocols in order to determine two key parameters: the effective particle density and the steric stabilizer layer thickness. The former parameter is essential for high resolution particle size analysis based on analytical (ultra)centrifugation techniques (e.g., disk centrifuge photosedimentometry, DCP), whereas the latter parameter is of fundamental importance in determining the effec… Show more

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Cited by 70 publications
(117 citation statements)
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References 114 publications
(183 reference statements)
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“…57 However, with only a few exceptions, [62][63][64][65][66][67][68] RAFT aqueous emulsion polymerization formulations usually result in kineticallytrapped spheres. 40,[42][43][44][45][46][47][48][49][50]69,70 Nevertheless, it was considered prudent to explore higher copolymer concentrations, if only to establish the upper limit for the production of well-defined epoxy-functional spheres. Thus PGMA 45 -PGlyMA 100 syntheses were conducted at 50°C at up to 40% w/w solids, see Table 2.…”
Section: Resultsmentioning
confidence: 99%
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“…57 However, with only a few exceptions, [62][63][64][65][66][67][68] RAFT aqueous emulsion polymerization formulations usually result in kineticallytrapped spheres. 40,[42][43][44][45][46][47][48][49][50]69,70 Nevertheless, it was considered prudent to explore higher copolymer concentrations, if only to establish the upper limit for the production of well-defined epoxy-functional spheres. Thus PGMA 45 -PGlyMA 100 syntheses were conducted at 50°C at up to 40% w/w solids, see Table 2.…”
Section: Resultsmentioning
confidence: 99%
“…36,41 In contrast, RAFT aqueous emulsion polymerizations often result in the formation of kinetically-trapped spheres, particularly for methacrylic core-forming blocks based on methyl methacrylate, [42][43][44][45] n-butyl methacrylate, 46,47 benzyl methacrylate 48 or 2,2,2-trifluoroethyl methacrylate. 49,50 Nevertheless, the latter PISA formulations offer a potentially important route for the preparation of functional diblock copolymer nano-objects at up to 50% w/w solids, which represents a substantial improvement over traditional postpolymerization self-assembly techniques. 30 We have previously reported using poly(glycerol monomethacrylate) (PGMA) as a steric stabilizer block for the preparation of diblock copolymer nano-objects via RAFT aqueous dispersion polymerization, 30 RAFT alcoholic dispersion polymerization, 36 and RAFT aqueous emulsion polymerization.…”
Section: Introductionmentioning
confidence: 99%
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“…The monomer‐swollen spherical block copolymer particles initially formed during the process fuse together according to a polymerization‐induced reorganization mechanism, as visualized in transmission electron microscopy (TEM) studies by Armes and co‐workers . Although, the same process could take place in emulsion polymerization, kinetically trapped spheres are obtained most of the time . (see section 5).…”
Section: The Pisa Processmentioning
confidence: 98%
“…Over the past decade or so, polymerization‐induced self‐assembly (PISA) has become widely recognized as a powerful platform technology for the rational design of block copolymer nanoparticles of various morphologies, including spheres, worms, vesicles, framboidal vesicles, and lamellae . In the specific context of RAFT aqueous emulsion polymerization, PISA typically involves chain extension of a water‐soluble polymer precursor using a water‐immiscible monomer such as styrene, benzyl methacrylate, 2,2,2‐trifluoroethyl methacrylate, methyl methacrylate, or n ‐butyl acrylate . At a certain critical degree of polymerization (DP), the growing hydrophobic block becomes insoluble in the aqueous phase, which drives in situ self‐assembly to form sterically stabilized diblock copolymer nano‐objects.…”
Section: Introductionmentioning
confidence: 99%