2009
DOI: 10.21236/ada505439
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Determining Plasma Potential from RF Measurements Using an Impedance Probe

Abstract: Standard Form 298 (Rev. 8-98) Prescribed by ANSI Std. Z39.18 Public reporting burden for this collection of information is estimated to average 1 hour per response, including the time for reviewing instructions, searching existing data sources, gathering and maintaining the data needed, and completing and reviewing this collection of information. Send comments regarding this burden estimate or any other aspect of this collection of information, including suggestions for reducing this burden to Department of De… Show more

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“…If the impedance measurement uncertainty is required to be less than 10%, the impedance of the ring electrodes needs to be designed to fall within 10–200 Ohms (see impedance error of the shunt configuration in fig. 3 of Walker 23 ). For the non‐substrate‐embedded ring electrodes, the characteristic impedance is determined by the structural ratio η and the dielectric properties of the medium to be measured.…”
Section: Discussionmentioning
confidence: 99%
“…If the impedance measurement uncertainty is required to be less than 10%, the impedance of the ring electrodes needs to be designed to fall within 10–200 Ohms (see impedance error of the shunt configuration in fig. 3 of Walker 23 ). For the non‐substrate‐embedded ring electrodes, the characteristic impedance is determined by the structural ratio η and the dielectric properties of the medium to be measured.…”
Section: Discussionmentioning
confidence: 99%