2007
DOI: 10.1016/j.talanta.2006.12.008
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Determination of trace arsenic on hanging copper amalgam drop electrode

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Cited by 23 publications
(9 citation statements)
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“…A similar shift of the peak potential was observed on the HMDE when copper(II) ions were added to the supporting electrolyte in micromolar quantities. Measurements carried out at the hanging copper amalgam drop electrode [36] give a peak potential similar to that in the case of the Hg(Cu)FE. When sulfur measurements are performed on the same surface (without refreshment), the analytical signal decreases.…”
Section: Renewable Amalgam Film Electrodesmentioning
confidence: 62%
“…A similar shift of the peak potential was observed on the HMDE when copper(II) ions were added to the supporting electrolyte in micromolar quantities. Measurements carried out at the hanging copper amalgam drop electrode [36] give a peak potential similar to that in the case of the Hg(Cu)FE. When sulfur measurements are performed on the same surface (without refreshment), the analytical signal decreases.…”
Section: Renewable Amalgam Film Electrodesmentioning
confidence: 62%
“…Dependence of the arsenic peak current on the deposition potential in a solution containing hydrochloric acid and copper ions has been studied many times and has been precisely described in the literature [6,7,24,34]. Concerning that the proposed procedure is optimized for samples containing surfactants the dependence of the arsenic peak current on the deposition potential in the presence of 1 mg…”
Section: Effect Of Deposition Potential and Timementioning
confidence: 99%
“…On the basis of this results the deposition potential of À 0.44 V was chosen as the most appropriate; this potential is also preferred for the solutions containing no surfactants and resin [24].…”
Section: Effect Of Deposition Potential and Timementioning
confidence: 99%
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