1990
DOI: 10.1364/ao.29.002850
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Determination of the optical properties of amorphous selenium films by a classical damped oscillator model

Abstract: Amorphous selenium films were produced by vacuum evaporation onto glass and aluminum substrates. The chemical composition of the films and interfaces were studied using scanning Auger electron spectroscopy. To gain some insight into the optical properties of the selenium films, we used the classical oscillator model to fit the transmittance spectrum.

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Cited by 7 publications
(13 citation statements)
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“…Therefore, in principle, two independent optical measurements are necessary at each spectral wavelength to solve for the unknowns and but, in practice, the true geometric thickness of the film is not known in prior and is thus to be determined at the same time-that is, three unknowns to be retrieved from two independent optical measurements at the same spectral wavelength, which demands adequate model suppositions or an otherwise optical analytical approach (Tan, 2006;Tan et al, 2007;Tan et al, 2006;Vautier et al, 1988;Bettstelleret al, 1993;Mulama et al, 2014;Benkhedir, 2006;Solieman et al, 2014;Adachi & Kao1980;Kotkata & Abdel-Wahab, 1990;Kotkata et al, 2009;Navarrete et al, 1990;Solieman & Abu-Sehly, 2010;Nagels et al, 1995;Tichy et al, 1996;Nagels et al, 1997;Tauc, 1972;Tauc, 1979;Heavens, 1991;Azzam & Bashara, 1987;Ward, 1994;Dragoman & Dragoman, 2002;Stenzel, 2005;Joo et al, 1999;Dobrowolski et al, 1983;Klein et al, 1990;Kukinyi et al, 1996;Chiao et al, 1995;Case, 1983;Peng & Desu, 1994;Birgin et al, 1999;Mulato et al, 2000;Erarslan & Gungor, 2010;Ventura et al, 2005;Manifacier et al, 1976;Swanepoel, 1983;Minkov, 1990;El-Naggar et al, 2009;…”
Section: Measurements and Analytical Techniques For Determining Opticmentioning
confidence: 99%
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“…Therefore, in principle, two independent optical measurements are necessary at each spectral wavelength to solve for the unknowns and but, in practice, the true geometric thickness of the film is not known in prior and is thus to be determined at the same time-that is, three unknowns to be retrieved from two independent optical measurements at the same spectral wavelength, which demands adequate model suppositions or an otherwise optical analytical approach (Tan, 2006;Tan et al, 2007;Tan et al, 2006;Vautier et al, 1988;Bettstelleret al, 1993;Mulama et al, 2014;Benkhedir, 2006;Solieman et al, 2014;Adachi & Kao1980;Kotkata & Abdel-Wahab, 1990;Kotkata et al, 2009;Navarrete et al, 1990;Solieman & Abu-Sehly, 2010;Nagels et al, 1995;Tichy et al, 1996;Nagels et al, 1997;Tauc, 1972;Tauc, 1979;Heavens, 1991;Azzam & Bashara, 1987;Ward, 1994;Dragoman & Dragoman, 2002;Stenzel, 2005;Joo et al, 1999;Dobrowolski et al, 1983;Klein et al, 1990;Kukinyi et al, 1996;Chiao et al, 1995;Case, 1983;Peng & Desu, 1994;Birgin et al, 1999;Mulato et al, 2000;Erarslan & Gungor, 2010;Ventura et al, 2005;Manifacier et al, 1976;Swanepoel, 1983;Minkov, 1990;El-Naggar et al, 2009;…”
Section: Measurements and Analytical Techniques For Determining Opticmentioning
confidence: 99%
“…A common approach is the indirect (inverse) synthesis technique { , }⟶{ , }, which is based on inserting multi-constant dispersion function for and (Tan, 2006;Tan et al, 2007;Tan et al, 2006;Theiss, 2012;Forouhi & Bloomer, 1986;Forouhi & Bloomer, 1988;Adachi, 1991;Jellison & Modine, 1996;Chambouleyron & Martínez, 2001;Truong & Tanemura, 2006;Kasap & Capper, 2006;Christman, 1988;Rogalski & Palmer, 2000;Palik, 1998;Dressel & Grüner, 2002;Reitz et al, 1993) into theoretical formulas of transmittance and/or reflectance of a multi-layered structure including the film, and then use a powerful statistical curve-fitting program to attain simulated transmittance and reflectance curves to the entire and data (Solieman et al, 2014;Navarrete et al, 1990;Solieman & Abu-Sehly, 2010;Joo et al, 1999;Dobrowolski et al, 1983;Klein et al, 1990;Kukinyi et al, 1996;Chiao et al, 1995;Theiss, 2012). Numeric inversion approaches, armed with dielectric models, are also used for analyzing optical data acquired from spectroscopic ellipsometry, which are based on measured polarized-light reflection quantities of a structure that are directly related its optical functions.…”
Section: Measurements and Analytical Techniques For Determining Opticmentioning
confidence: 99%
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