Determination of layer-thickness fluctuations in Mo/Si multilayers by cross-sectional HR-TEM and X-ray diffraction

Aschentrup, A; Hachmann, Wiebke; Westerwalbesloh, T.; Lim, Y.C.; Kleineberg, Ulf; Heinzmann, Ulrich

doi:10.1007/s00339-003-2130-8

Cited by 9 publications

(3 citation statements)

References 25 publications

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“…Our method is even able to determine the individual interlayer compositions, for example, MoSi 2 at the Si-on-Mo interface and Mo 3 Si 5 at the Mo-on-Si interface. This result is in contrast to the general assumption 6,14,15 that the composition of both types of interlayers is equal. This assumption is based on the limitation of the analysis using reflectometry, which is unable to distinguish a Mo 3 Si 5 layer from a thinner MoSi 2 layer.…”

Section: Discussioncontrasting

confidence: 54%

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Determination of in-depth density profiles of multilayer structures

Kessels

Bijkerk

Tichelaar

et al. 2005

Journal of Applied Physics

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We developed and demonstrate an analysis method in which we calibrate the intensity scale of cross-sectional transmission electron microscopy ͑TEM͒ using Cu K ␣ reflectometry. This results in quantitative in-depth density profiles of multilayer structures. Only three free parameters are needed to obtain the calibrated profiles, corresponding to three TEM image intensity levels. Additionally, the optical indices of the two multilayer materials used and the assumption that the layers are laterally homogeneous are used in the model. The power and the general usefulness of the method is demonstrated using experimental data of W / Si and Mo/ Si multilayer systems with sharp interfaces as well as multilayers of which the interfaces were deliberately intermixed.

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Section: Discussioncontrasting

confidence: 54%

“…Aschentrup et al 6 demonstrated a method in which they reduced the number of free parameters by determining the layer thicknesses from CS-TEM images. Although this improves the reliability of the result, it still heavily depends on the implicit information contained in the model used to describe the expected structure.…”

Section: Introductionmentioning

confidence: 99%

Determination of in-depth density profiles of multilayer structures

Kessels

Bijkerk

Tichelaar

et al. 2005

Journal of Applied Physics

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“…It is known that for angle of incidence higher than θ c , the reflectivity drops with increasing angle θ as θ −4 [43]. As the coating thickness is high (∼1.8 µm), no Kiessig's fringes were observed due to the instrumental limitation and high absorption coefficients of the component materials [44,45].…”

Section: Effect Of Modulation Wavelength On the Interface Propertiesmentioning

confidence: 99%

Investigation of interface properties of sputter deposited TiN/CrN superlattices by low angle x-ray reflectivity

Barshilia

Selvakumar

Rajam

et al. 2008

J. Phys. D: Appl. Phys.

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Approximately 1.8 µm thick nanolayered multilayer coatings of TiN/CrN (also known as superlattices) were deposited on silicon (1 0 0) substrates at different modulation wavelengths (4.6–12.8 nm), substrate temperatures (50–400 °C) and substrate bias voltages (−50 to −200 V) using a reactive direct current magnetron sputtering system. The x-ray reflectivity (XRR) technique was employed to determine various properties of the multilayers such as interface roughness, surface roughness, electron density, critical angle and individual layer thicknesses. The modulation wavelengths of the TiN/CrN superlattice coatings were calculated using a modified Bragg's law. Furthermore, the experimental XRR patterns were simulated using theoretically generated patterns and a good fit was obtained for a three layer model, i.e. (1) top surface roughness layer, (2) TiN/CrN multilayer coating (approximately 1.8 µm) and (3) Ti interlayer (∼0.5 µm) at the film–substrate interface. For the superlattice coatings prepared at a modulation wavelength of 9.7 nm, a substrate bias of −200 V and a substrate temperature of 400 °C the XRR patterns showed Bragg reflections up to 5th order, indicating well-defined periodicity of the constituent layers and relatively sharp interfaces. The simulation showed that the superlattice coatings prepared under the above conditions exhibited low surface and interface roughnesses. We also present the effect of substrate temperature and substrate bias, which are critical parameters for controlling the superlattice properties, onto the various interface properties of TiN/CrN superlattices.

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Design of reflective quarter-wave plates in extreme ultraviolet

Lin

Chen

et al. 2015

Optics Communications

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Determination of layer-thickness fluctuations in Mo/Si multilayers by cross-sectional HR-TEM and X-ray diffraction

Cited by 9 publications

References 25 publications

Determination of in-depth density profiles of multilayer structures

Determination of in-depth density profiles of multilayer structures

Investigation of interface properties of sputter deposited TiN/CrN superlattices by low angle x-ray reflectivity

Design of reflective quarter-wave plates in extreme ultraviolet

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