Determination of layer structure in Mo/Si multilayers using soft X-ray reflectivity

Modi, Mohammed H.; Lodha, G. S.; Nayak, M.; Sinha, A. K.; Nandedkar, R. V.

doi:10.1016/s0921-4526(02)01539-9

Cited by 25 publications

(14 citation statements)

References 23 publications

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“…Our method is even able to determine the individual interlayer compositions, for example, MoSi 2 at the Si-on-Mo interface and Mo 3 Si 5 at the Mo-on-Si interface. This result is in contrast to the general assumption 6,14,15 that the composition of both types of interlayers is equal. This assumption is based on the limitation of the analysis using reflectometry, which is unable to distinguish a Mo 3 Si 5 layer from a thinner MoSi 2 layer.…”

Section: Discussioncontrasting

confidence: 84%

Determination of in-depth density profiles of multilayer structures

Kessels

Bijkerk

Tichelaar

et al. 2005

Journal of Applied Physics

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We developed and demonstrate an analysis method in which we calibrate the intensity scale of cross-sectional transmission electron microscopy ͑TEM͒ using Cu K ␣ reflectometry. This results in quantitative in-depth density profiles of multilayer structures. Only three free parameters are needed to obtain the calibrated profiles, corresponding to three TEM image intensity levels. Additionally, the optical indices of the two multilayer materials used and the assumption that the layers are laterally homogeneous are used in the model. The power and the general usefulness of the method is demonstrated using experimental data of W / Si and Mo/ Si multilayer systems with sharp interfaces as well as multilayers of which the interfaces were deliberately intermixed.

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Section: Discussioncontrasting

confidence: 84%

Determination of in-depth density profiles of multilayer structures

Kessels

Bijkerk

Tichelaar

et al. 2005

Journal of Applied Physics

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“…In the analysis of the multilayer system, imperfect interfaces in real multilayer system were usually dealt with by using the statistical method or the incorporation of the interlayer between the two-layer system. [13] In the statistical method, we introduced σ (roughness) in the calculation of a two-layer model and σ was the only parameter to describe the interface imperfections in the calculation. So σ was a statistical parameter in this model since it included all the effects of the interface imperfections such as rough interface, interdiffusion of layer, and formation of a compound.…”

Section: Soft X-ray Resonant Reflectivity Analysismentioning

confidence: 99%

“…This is because both the interdiffusion and formation of the compound between the two materials make it difficult to get a smooth interface. [8] Therefore, a study on the layer structure and interface properties at this wavelength was of importance. Imperfections such as formation of a compound and interlayer have been discovered in the study of other multilayers systems such as Mo/Si using TEM, XPS, and XES.…”

Section: Introductionmentioning

confidence: 99%

Study on the layer structure of W/C multilayers deposited by magnetron sputtering using x‐ray reflectivity

Deng

Shao

2008

Surface & Interface Analysis

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A study on the layer structure of W/C multilayers deposited by magnetron sputtering is reported. In the study, soft x-ray resonant reflectivity and hard x-ray grazing incidence reflectivity of the W/C multilayers were measured. The imperfections at the interface such as interdiffusion and formation of compounds were dealt with by two methods. On analyzing the experimental results, we found that the incorporation of an interlayer was a more suitable method than the traditional statistical method to describe the layer structure of a W/C system we fabricated. The optical constants of each layer at a wavelength of 4.48 nm were also obtained from the analysis.

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“…Interface roughness severely degrades the multilayer quality [2,3] where shape of the interfaces, roughness correlations, and their conformility with underneath layers, are some of the influencing parameters. Scattering losses generated at imperfect boundaries lead to a performance degradation of x-ray optics.…”

Section: Introductionmentioning

confidence: 99%