Determination of electromagnetic properties of low-pressure electrodeless inductive discharges

Denneman, J. W.

doi:10.1088/0022-3727/23/3/003

Cited by 56 publications

(33 citation statements)

References 7 publications

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“…It is established that the presence of both modes can to some extent be felt throughout the inductive discharge operation, [1][2][3][4][5][6] which is dominant in the mixed mode as demonstrated here with the help of EED evolution. It is quite interesting to revisit this hybrid behavior in terms of field consultations.…”

Section: E Poynting Vector Representation For the Mixed Modementioning

confidence: 90%

“…2,3 A distinct feature of inductively coupled rf discharges is the existence of two operational modes which dramatically differ in their electrical and plasma properties. [1][2][3][4][5][6] The E mode ͑often referred to as the capacitive mode͒ excited at low rf powers, exhibiting a fainter light emission, much lower electron density ͑ϳ10 9 cm −3 ͒, a higher electron mean energy and a high plasma potential. It is thought to be maintained by the electrostatic field developed across the powered end of the coil and the ground.…”

Section: Introductionmentioning

confidence: 99%

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Hysteresis and mode transition in terms of electron energy distribution function for an inductively coupled argon discharge

Singh

2008

Journal of Applied Physics

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Please check the document version of this publication:• A submitted manuscript is the version of the article upon submission and before peer-review. There can be important differences between the submitted version and the official published version of record. People interested in the research are advised to contact the author for the final version of the publication, or visit the DOI to the publisher's website.• The final author version and the galley proof are versions of the publication after peer review.• The final published version features the final layout of the paper including the volume, issue and page numbers. Link to publication General rightsCopyright and moral rights for the publications made accessible in the public portal are retained by the authors and/or other copyright owners and it is a condition of accessing publications that users recognise and abide by the legal requirements associated with these rights.• Users may download and print one copy of any publication from the public portal for the purpose of private study or research.• You may not further distribute the material or use it for any profit-making activity or commercial gain • You may freely distribute the URL identifying the publication in the public portal.If the publication is distributed under the terms of Article 25fa of the Dutch Copyright Act, indicated by the "Taverne" license above, please follow below link for the End User Agreement: The electron energy distribution function ͑EEDF͒ with respect to the hysteresis loop of an inductively coupled argon discharge has been studied experimentally. Contrary to H mode, knowledge of EEDF in E mode is still limited, and an elaborate EEDF measurement with regard to power and pressure for this mode is presented. The Langmuir probe measurements reveal two regions with distinct EEDFs in E mode, which might be a critical missing factor in explaining the unresolved hysteresis and mode transition phenomenon of inductive discharges. Furthermore, a Poynting vector representation has been used to explain the power coupling in an inductive discharge, where ͑azimuthal͒ e component is proposed to be dominant in the "hybrid mode" region.

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Section: E Poynting Vector Representation For the Mixed Modementioning

confidence: 90%

Section: Introductionmentioning

confidence: 99%

Hysteresis and mode transition in terms of electron energy distribution function for an inductively coupled argon discharge

Singh

2008

Journal of Applied Physics

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“…In low power ICPs, it is normally done with measuring reflected power from the load using directional coupler in a feedback mechanism. In fusion grade ion source operation [7,8], such online methodology is not present but remote tuning by adjusting the driving frequency of the RF generator between the ion source operation pulses is envisaged A set of analytical formulation is presented based on air core transformer model [12,13,14]. In the model, RF antenna coil is considered as transformer primary coil and the plasma as the single turn secondary coil.…”

Section: Introductionmentioning

confidence: 99%

Online tuning of impedance matching circuit for long pulse inductively coupled plasma source operation—An alternate approach

Sudhir

Bandyopadhyay

Kraus

et al. 2014

Review of Scientific Instruments

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Impedance matching circuit between RF generator and the plasma load, placed between them determines the RF power transfer from RF generator to the plasma load. The impedance of plasma load depends on the plasma parameters through skin depth and plasma conductivity or resistivity. Therefore, for long pulse operation of ICPs, particularly for high power (~ 100kW or more) where plasma load condition may vary due to different reasons (e.g. pressure, power, thermal etc.), online tuning of impedance matching circuit is necessary through feedback. In fusion grade ion source operation such online methodology through feedback is not present but offline remote tuning by adjusting the matching circuit capacitors and tuning the driving frequency of the RF generator between the ion source operation pulses is envisaged. The present model is an approach for remote impedance tuning methodology for long pulse operation and corresponding online impedance matching algorithm based on RF coil antenna current measurement or coil antenna calorimetric measurement may be useful in this regard. Introduction:

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“…These properties must be accurately described in ICP models to predict plasma radial uniformity, a crucial issue for future large-area processes. In present models that consider induced rf electric (but not magnetic) fields, the rf power is transferred to plasma electrons within a skin layer near the plasma surface [2][3][4][11][12][13][14][15][16]. The electron heating is either collisional (Ohmic) or collisionless (stochastic) [12,16].…”

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confidence: 99%

Enhanced Radio Frequency Field Penetration in an Inductively Coupled Plasma

Tuszewski

1996

Phys. Rev. Lett.

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The induced radio frequency magnetic fields of a low-frequency inductively coupled plasma are measured and modeled. The fields penetrate deep into the discharge, in contrast with existing predictions of field decay within a thin skin layer. Fluid calculations show that the enhanced penetration is due to a reduction of the plasma conductivity by the induced magnetic fields.[S0031-9007(96)00766-1] PACS numbers: 52.40.Db, 52.50.Gj, 52.80.Pi Inductively coupled plasmas (ICPs) consist of a dielectric chamber surrounded by a conducting coil [1]. Radio frequency (rf) power continuously applied to the coil induces electric fields that partially ionize a gas inside the chamber and sustain a discharge. ICPs have in the past been operated with high (1-760 Torr) gas pressures for thermal [2] and lighting [3] applications. Recently, ICPs have been rediscovered by the semiconductor and other industries as an important class of high-density ͑10 11 10 12 cm 23 ͒, low-pressure (1-10 mTorr) plasma sources [4]. Present low-pressure ICP development [5-10] and modeling [11][12][13][14][15][16] are among the most active areas of plasma research.The understanding of rf power absorption is fundamental to ICP heating and transport properties. These properties must be accurately described in ICP models to predict plasma radial uniformity, a crucial issue for future large-area processes. In present models that consider induced rf electric (but not magnetic) fields, the rf power is transferred to plasma electrons within a skin layer near the plasma surface [2][3][4][11][12][13][14][15][16]. The electron heating is either collisional (Ohmic) or collisionless (stochastic) [12,16]. For typical rf frequencies of 0.1-13.56 MHz, the skin depths are a few cm while device dimensions are 10 -30 cm. The ICPs can be cylindrical [2,3,5], planar [6-9], or hemispherical [10]. The measured skin depths are consistent with the above models [2,3,7].In this Letter, data are presented that show deep rf penetration into argon ICP discharges. For these data, stochastic effects are unimportant and collisional skin depths are small. Hence, a new mechanism must be invoked to explain the enhanced rf field penetration. Fluid calculations suggest that this mechanism is a reduction of the plasma conductivity by the induced rf magnetic fields when the electron cyclotron angular frequency v c exceeds the rf angular frequency v and the electron-neutral collision frequency n. This condition is satisfied for many low-pressure ICPs. Hence, the induced rf magnetic fields must be included in ICP models to predict electron heating and the resulting plasma transport. The influence of rf magnetic fields on ICP density profiles (the ponderomotive effect) has already been identified [17][18][19].

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Determination of electromagnetic properties of low-pressure electrodeless inductive discharges

Cited by 56 publications

References 7 publications

Hysteresis and mode transition in terms of electron energy distribution function for an inductively coupled argon discharge

Hysteresis and mode transition in terms of electron energy distribution function for an inductively coupled argon discharge

Online tuning of impedance matching circuit for long pulse inductively coupled plasma source operation—An alternate approach

Enhanced Radio Frequency Field Penetration in an Inductively Coupled Plasma

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