1996
DOI: 10.1063/1.363401
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Determination of defect distributions from admittance measurements and application to Cu(In,Ga)Se2 based heterojunctions

Abstract: Impact of oxygen bonding on the atomic structure and photoluminescence properties of Si-rich silicon nitride thin films J. Appl. Phys. 112, 073514 (2012) Electron spin resonance features of the Ge Pb1 dangling bond defect in condensation-grown (100)Si/SiO2/Si1−xGex/SiO2 heterostructures J. Appl. Phys. 112, 074501 (2012) Capacitance spectroscopy study of deep levels in Cl-implanted 4H-SiC J. Appl. Phys. 112, 063717 (2012) Investigation of defect levels in Cs2Hg6S7 single crystals by photoconductivity and … Show more

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Cited by 703 publications
(581 citation statements)
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References 28 publications
(18 reference statements)
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“…will be able to contribute to the junction capacitance [22,23]. Here T k B corresponds to the thermal energy and 0  denotes a characteristic frequency, and…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…will be able to contribute to the junction capacitance [22,23]. Here T k B corresponds to the thermal energy and 0  denotes a characteristic frequency, and…”
Section: Resultsmentioning
confidence: 99%
“…1). The density of defect states (DOS) ) (E g t was stated to be related to the derivative of the capacitance with respect to the frequency as [22],…”
Section: Resultsmentioning
confidence: 99%
“…TAS is a well-established, effective technique for characterizing both shallow and deep defects, which has been broadly applied in understanding defects in thin film 27,28 and organic solar cells 29 . The energetic profile of trap density of states (tDOS) can be derived from the angular frequency dependent capacitance using the equation: 30…”
Section: Discussionmentioning
confidence: 99%
“…More information about the method and technology of CV spectroscopy itself are also given in the above mentioned references [1][2][3][4][5].…”
mentioning
confidence: 99%
“…1 Introduction Capacitance-voltage (CV) spectroscopy of a metal-insulator-semiconductor (MIS) allows quantifying the number of defects (N D ) in the insulator bulk as well as at the insulator/semiconductor interface [1][2][3][4][5]. In the field of photovoltaics (PV) the CV characterization method is commonly used to analyze materials for surface passivation of crystalline silicon (c-Si).…”
mentioning
confidence: 99%