The density of atomic oxygen in pulsed microwave excited oxygen plasmas has
been measured by means of time-resolved two-photon laser-induced
fluorescence. The plasma source is a slot antenna type that is operated at
2.45 GHz. Calibration of the measurements has been performed by the use of a
two-photon transition of xenon in order to obtain absolute densities of atomic
oxygen in the downstream zone. Besides the influence of pulse frequency on
the time-averaged density, we also studied pulsed plasmas at higher
pressures, which show a significant delay between the onset of microwave
power and the rise of the atomic oxygen density. By changing pulse frequency,
an optimum frequency is obtained which leads to a gain in the measured
time-averaged atomic oxygen density as compared to cw plasmas. This effect
is compared to the properties of deposited films generated in a pulsed
oxygen/hexamethyldisiloxane process plasma. The results are
discussed in the framework of a volume-averaged model for oxygen plasmas,
which takes into account molecular and atomic oxygen, metastable oxygen, and
positive and negative oxygen ions.