Indium tin oxide
(ITO) films constitute components of many layered
heterostructures used for emergent technologies beyond conventional
optoelectronics. Compositional and morphological changes have a direct
impact on the device’s performance. Hence control over the
morphology with advanced multimodal characterization approaches is
required to evaluate the devices. Herein multilayer ITO films deposited
by spin-coating were quantified in nanoscale detail in three dimensions
by combining results from depth-sensitive neutron reflectometry (NR),
noncontact topographic AFM images, and cross-sectional SEM images.
Films with a different number of deposited layers were visually transparent
even though the topmost layer was as high as 60% porous, with porosity
gradually decreasing as the number of the underneath sublayers increased.
Surface and interfacial roughness through the total film and individual
layer thickness were obtained. NR data also furnished quantitative
depth information on the films’ chemical composition and layer-by-layer
bulk density, which has never been obtained before, providing a way
to monitor and ultimately control the sheet resistivity via the pore
network. When the same formulation is used for inkjet printing patterns,
the larger pores disappear, and the optical properties are improved
to >90% transmittance at all visible wavelengths. All 5L films
achieved
sheet resistivities as low as 10–2 Ω cm and
can therefore be used as patternable transparent electrodes for many
devices including liquid crystal displays.