Detailed numerical investigation of a DC sputter magnetron

Kolev, Ivan; Bogaerts, Annemie

doi:10.1109/tps.2006.875843

Cited by 32 publications

(25 citation statements)

References 50 publications

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“…The anode potential initially increases and then begins to decrease followed by low-amplitude oscillations before reaching an almost constant value which is typical of constant current PIC/MCC simulations. 33 It can be also seen that the anode potential reaches this steady state value in about 10 ns for the entire range of current densities considered in this work. An important aspect of the model described in this work is that the cathode fall thickness, cathode electric field, and hence the voltage required for a given a current density show no dependence on the gap size.…”

Section: Resultssupporting

confidence: 57%

Cathode fall model and current-voltage characteristics of field emission driven direct current microplasmas

Venkattraman

2013

Physics of Plasmas

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The post-breakdown characteristics of field emission driven microplasma are studied theoretically and numerically. A cathode fall model assuming a linearly varying electric field is used to obtain equations governing the operation of steady state field emission driven microplasmas. The results obtained from the model by solving these equations are compared with particle-in-cell with Monte Carlo collisions simulation results for parameters including the plasma potential, cathode fall thickness, ion number density in the cathode fall, and current density vs voltage curves. The model shows good overall agreement with the simulations but results in slightly overpredicted values for the plasma potential and the cathode fall thickness attributed to the assumed electric field profile. The current density vs voltage curves obtained show an arc region characterized by negative slope as well as an abnormal glow discharge characterized by a positive slope in gaps as small as 10 lm operating at atmospheric pressure. The model also retrieves the traditional macroscale current vs voltage theory in the absence of field emission. V C 2013 AIP Publishing LLC.

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Section: Resultssupporting

confidence: 57%

Cathode fall model and current-voltage characteristics of field emission driven direct current microplasmas

Venkattraman

2013

Physics of Plasmas

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“…The fact that the mean energy is approximately the same in the pressure range 25-100 mtorr can be attributed to the fact that at these pressures gas heating becomes significant 15 and the gas density remains more or less constant at rising pressure ͑due to the increased temperature͒. It is natural to expect that the mean energy will decrease more or less monotonically with the rise of pressure due to the increasing probability for elastic collisions.…”

Section: B Energies Of the Bombarding Speciesmentioning

confidence: 99%

“…15,16 Here, a brief summary of the main features with respect to the sputter-deposition process is given only. 14 The model includes the following plasma species: electrons, argon ions ͑Ar + ͒, sputtered copper atoms, singly ionized copper ions ͑Cu + ͒, argon fast atoms, and argon metastable atoms.…”

Section: Description Of the Modelmentioning

confidence: 99%

Numerical study of the sputtering in a dc magnetron

Kolev

Bogaerts

2008

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Investigation on the electrical properties and inhomogeneous distribution of ZnO:Al thin films prepared by dc magnetron sputtering at low deposition temperature High-energy ions and atoms sputtered and reflected from a magnetron source for deposition of magnetic thin films J.In this article, the process of sputtering and the behaviour of the sputtered atoms in a dc magnetron is studied by means of numerical simulations. The proposed model is a self-consistent approach, based on the particle-in-cell-Monte Carlo collision method. In this way, the process of sputtering is treated self-consistently with respect to the other processes in the magnetron plasma. The studied pressure range is 1 -100 mtorr. The effects of the target-substrate distance and the choice of the scattering angle in the collisions between sputtered atoms and background gas atoms are also discussed.

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“…the discharge current density can be higher than normal, but, unlike discharge in the absence of magnetic field, this discharge occupies a small part of the target electrode surface. The potential distribution in a magnetron discharge plasma [72,73] and corresponding electric field lines [74] ensure APPLICATION OF DUSTY PLASMA FOR PRODUCTION formation of an electrostatic trap for particles in such plasma, even if the electrode does not have macroscopic deviations from a plane shape. Plasma electrons move along magnetic field lines (see Fig.…”

Section: Deposition Of Coatings On Particles In An Rf Magnetron Dischmentioning

confidence: 99%

Application of dusty plasma for production of disperse composite materials

et al. 2015

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Objectives and achievements of the production of disperse composite materials (DCMs) which consist of particles with a metal coating are represented. The prospects of the DCM production by the dusty plasma method based on confining a cloud of micron-sized particles in a discharge plasma and on magnetron sputtering are shown. The method was tested in the preparation of catalyst materials, a superhard diamond polycrystalline material, and a polyquasicrystalline material with a low friction coefficient. The results of investigations of the structure and properties of powdered and sintered DCMs are presented.

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Detailed numerical investigation of a DC sputter magnetron

Cited by 32 publications

References 50 publications

Cathode fall model and current-voltage characteristics of field emission driven direct current microplasmas

Cathode fall model and current-voltage characteristics of field emission driven direct current microplasmas

Numerical study of the sputtering in a dc magnetron

Application of dusty plasma for production of disperse composite materials

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