2023
DOI: 10.3390/s23094482
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Designing Highly Precise Overlay Targets for Asymmetric Sidewall Structures Using Quasi-Periodic Line Widths and Finite-Difference Time-Domain Simulation

Abstract: The present study introduces an optimized overlay target design to minimize the overlay error caused by asymmetric sidewall structures in semiconductor manufacturing. To achieve this goal, the overlay error formula was derived by separating the asymmetric bottom grating structure into symmetric and asymmetric parts. Based on this formula, it was found that the overlay target design with the linewidth of the bottom grating closed to the grating period could effectively reduce the overlay error caused by the sid… Show more

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Cited by 1 publication
(1 citation statement)
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“…X-ray-based metrology may accidentally expose the photoresist. The optimized overlay mark design method proposed by Hung-Chih Hsieh aims to minimize the overlay error caused by asymmetric overlay marks [24]. Their findings indicate that ensuring the linewidth of the bottom overlay mark matches the pitch of the top overlay mark effectively reduces the overlay error.…”
Section: Introductionmentioning
confidence: 99%
“…X-ray-based metrology may accidentally expose the photoresist. The optimized overlay mark design method proposed by Hung-Chih Hsieh aims to minimize the overlay error caused by asymmetric overlay marks [24]. Their findings indicate that ensuring the linewidth of the bottom overlay mark matches the pitch of the top overlay mark effectively reduces the overlay error.…”
Section: Introductionmentioning
confidence: 99%