Design Ultra-Compact Aspherical Lenses for Extended Sources Using Particle Swarm Optical Optimization Algorithm

Abstract

This paper presents a global optimization algorithm specifically tailored for ultracompact aspherical lens design problems for extended LED sources. The main purpose is to obtain prescribed illumination patterns, particularly the uniform illuminance distribution. This method begins by calculating the initial aspherical lens with two surfaces based on point source approximation. Then a system of polynomials is employed to fit the meridian curves of the two surfaces. In the optimization process, we use the particle swarm optimization (PSO) algorithm to automatically find the optimal polynomial coefficients when the ray tracing simulation is being performed. A series of ultra-compact aspherical lenses with dimension ratio of h/d ranging from 0.95 to 1.25 are presented, where h denotes the center height of the lens and d represents the diameter of the extended source. The results show the high efficiency and versatility of the proposed method in prescribed illumination design for extended LED sources in three-dimensional rotational symmetry geometry. Additionally, an aspherical lens is fabricated and tested, and its practical performance approaches the design.

Efficient and compact freeform optics design for customized LED lighting

“…When the source size becomes non-negligible, the design of freeform lenses must consider the spatial extents of light sources. The designs for extended light sources are still largely relied on optimization [26][27][28] and feedback methods [29,30] that lack rigorous modeling. Several direct methods have been proposed based on PDEs and edge rays tailoring applicable for 2D cases or rotational geometry [31][32][33][34].…”

Traceable Reference Full Metrology Chain for Innovative Aspheric and Freeform Optical Surfaces Accurate at the Nanometer Level

“…With respect to the increasing demand for high quality aspherical and freeform optics in different fields (lithography, lasers, imaging, etc.) [1][2][3][4], metrology capabilities of aspheric and freeform surfaces must be aligned with advances made in the optical design domain [5].…”

“…With respect to the increasing demand for high quality aspherical and freeform optics in different fields (lithography, lasers, imaging, etc.) [ 1 , 2 , 3 , 4 ], metrology capabilities of aspheric and freeform surfaces must be aligned with advances made in the optical design domain [ 5 ]. The need for an accurate full metrology chain for asphere and freeform optics is not exclusively reserved to the extreme ultraviolet lithography (EUVL) [ 6 ], but it concerns also the synchrotron [ 7 , 8 ], astronomy [ 9 , 10 ], medical device [ 11 ], security and several other domains.…”