2011
DOI: 10.1002/app.34512
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Design, synthesis, and imaging study of a photoactive polymer containing aryl substituted diazoketo groups

Abstract: A photoactive polymer containing aryl substituted diazoketo groups was prepared by radical polymerization of methyl methacrylate, 2-hydroxyethyl methacrylate and photoactive 2-(2-diazo-3-oxo-3-(4-dimethylaminophenyl)-propionyloxy)-ethyl methacrylate. Upon UV irradiation at 365 nm, the diazoketo groups of the copolymer underwent the Wolff rearrangement and afforded ketenes that reacted with water to provide carboxylic moieties that could be removed by basic developer. It was demonstrated that this photoactive p… Show more

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Cited by 6 publications
(6 citation statements)
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“…Benzoylacetic acid was prepared according to the literature procedure . To a solution of acetophenone (12 g, 0.10 mol), dry tetrahydrofuran (50 mL) in 250 mL overnight-oven-dried round-bottomed flask, NaH (60%) in oil (10.5 g, 0.25 mol) and dimethylcarbonate (16.2 g, 0.18 mol) was added.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…Benzoylacetic acid was prepared according to the literature procedure . To a solution of acetophenone (12 g, 0.10 mol), dry tetrahydrofuran (50 mL) in 250 mL overnight-oven-dried round-bottomed flask, NaH (60%) in oil (10.5 g, 0.25 mol) and dimethylcarbonate (16.2 g, 0.18 mol) was added.…”
Section: Methodsmentioning
confidence: 99%
“…32 To a solution of acetophenone (12 g, 0.10 mol), dry tetrahydrofuran (50 mL) in 250 mL overnight-oven-dried round-bottomed flask, NaH (60%) in oil (10.5 g, 0.25 mol) and dimethylcarbonate (16.2 g, 0.18 mol) was added. The suspension was heated to reflux for 2 h and cooled to room temperature.…”
Section: Ancestral Enzyme Reconstructionmentioning
confidence: 99%
“…23 During the past decade, there were several excellent works demonstrating some polyimide and polymethacrylate systems, including o-NB group could be used as positive photoresist. [24][25][26][27][28][29] O-NB groups were used as photolabile-protecting groups for carboxyl acids UV irradiation, so that the photoresist resins could be etched alone without photoacid generators. These V C 2014 Wiley Periodicals, Inc. polymer resins were synthesized by using polycondensation, 24 free radical polymerization 25 , and atom transfer radical polymerization (ATRP) methods.…”
Section: Introductionmentioning
confidence: 99%
“…[24][25][26][27][28][29] O-NB groups were used as photolabile-protecting groups for carboxyl acids UV irradiation, so that the photoresist resins could be etched alone without photoacid generators. These V C 2014 Wiley Periodicals, Inc. polymer resins were synthesized by using polycondensation, 24 free radical polymerization 25 , and atom transfer radical polymerization (ATRP) methods. [26][27][28][29][30] Moreover, these photoresists were mainly applied in the fields of protein immobilization and incorporated very expensive monomers such as ethyleneglycol methacrylate 26 and fluoromethacylate.…”
Section: Introductionmentioning
confidence: 99%
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