Design space exploration for early identification of yield limiting patterns

Abstract

In order to resolve the causality dilemma of which comes first, accurate design rules or real designs, this paper presents a flow for exploration of the layout design space to early identify problematic patterns that will negatively affect the yield.A new random layout generating method called Layout Schema Generator (LSG) is reported in this paper, this method generates realistic design-like layouts without any design rule violation. Lithography simulation is then used on the generated layout to discover the potentially problematic patterns (hotspots). These hotspot patterns are further explored by randomly inducing feature and context variations to these identified hotspots through a flow called Hotspot variation Flow (HSV). Simulation is then performed on these expanded set of layout clips to further identify more problematic patterns.These patterns are then classified into design forbidden patterns that should be included in the design rule checker and legal patterns that need better handling in the RET recipes and processes.

Advanced process and electron device technology

“…A hotspot fixing flow is proposed, which is based on random pattern generation, source mask co-optimization, and lithography performance analysis; this flow could also optimize the design rule and obtain the lithography RET solution [67] . The layout schema generator is used to generate realistic design-like layouts and then uses lithography simulation to determine hotspots and use them to complement design forbidden patterns [68] . Design rules for the new technology node are modified by the guide of the detection and fixing of hotspots [69] .…”