“…Compared with the traditional flexible copper microcircuit based on liquid ink or laser reduction, the resistivity of 200-0.5-Ag/Cu also reached a matching value, and it was in the middle level. [13][14][15][16][17][18][19][20][21][22][23][24]55 Fig. 10(c) and (d) further validate this result with five LED lights in series.…”
Section: Complex and Long Copper Microcircuit Growthsupporting
confidence: 56%
“…Compared with the traditional flexible copper microcircuit based on liquid ink or laser reduction, the resistivity of 200-0.5-Ag/Cu also reached a matching value, and it was in the middle level. 13–24,55…”
Section: Resultsmentioning
confidence: 99%
“…[9][10][11][12] Therefore, the electroless plating at near room temperature shows unusual potential. [13][14][15][16][17][18][19][20][21][22][23] The chemical copper plating process generally involves three steps: the modification of flexible substrates, the reduction of catalytic seeds, and the growth of copper microcircuits. 16,18,[24][25][26] Chen et al 27 modified polyimide (PI) films using a strong alkaline solution, and subsequently printed Cu(II) ink and reductive ink respectively to form copper nanoparticle catalytic patterns.…”
The complex patterns of flexible copper microcircuits were fabricated through chemical growth welding of silver seeds at a low temperature, exhibiting good conductivity, flexibility and fatigue durability.
“…Compared with the traditional flexible copper microcircuit based on liquid ink or laser reduction, the resistivity of 200-0.5-Ag/Cu also reached a matching value, and it was in the middle level. [13][14][15][16][17][18][19][20][21][22][23][24]55 Fig. 10(c) and (d) further validate this result with five LED lights in series.…”
Section: Complex and Long Copper Microcircuit Growthsupporting
confidence: 56%
“…Compared with the traditional flexible copper microcircuit based on liquid ink or laser reduction, the resistivity of 200-0.5-Ag/Cu also reached a matching value, and it was in the middle level. 13–24,55…”
Section: Resultsmentioning
confidence: 99%
“…[9][10][11][12] Therefore, the electroless plating at near room temperature shows unusual potential. [13][14][15][16][17][18][19][20][21][22][23] The chemical copper plating process generally involves three steps: the modification of flexible substrates, the reduction of catalytic seeds, and the growth of copper microcircuits. 16,18,[24][25][26] Chen et al 27 modified polyimide (PI) films using a strong alkaline solution, and subsequently printed Cu(II) ink and reductive ink respectively to form copper nanoparticle catalytic patterns.…”
The complex patterns of flexible copper microcircuits were fabricated through chemical growth welding of silver seeds at a low temperature, exhibiting good conductivity, flexibility and fatigue durability.
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