Design of Uniform Illumination Optical Source with 365 nm LED and Application in Lithography

王向贤,; 汪波,; 付强,; 陈漪恺,; 胡继刚,; 张斗国,; 明海,

doi:10.3788/cjl201239.0416001

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“…5,6 For years, the illumination system has always been a crucial modified point for optimizing the performance of UVLED-based lithography devices, especially for the improvement of the collimation system due to the Lambert divergence angle of the UVLED directly generating stray light or a ghost image without collimation. 7,8 To solve this issue, researchers have introduced various methods, such as the application of an optical spherical lenses, 9 reflective bowl, 10 total internal reflection lens, 11 and freeform lens. 12 Recently, the reflection concentrator based on a parabolic surface (compound parabolic concentrator) was proposed to collect solar energy and collimate the LED light.…”

Section: Introductionmentioning

confidence: 99%

Compact ultraviolet light-emitting diode-based lithography illumination system with tunable coherent factor

Liu

2023

Opt. Eng.

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.Optimization of the illumination system of an ultraviolet light-emitting diode (UVLED)-based lithography system by reducing the system complexity and spatial volume has been a research focus. This work proposes a compact lithography illumination system that applies a specially designed embedded compound parabolic concentrator (ECPC) to replace the traditional collimation module and the zoom lenses module. The ECPC, comprised of two detachable parabolic surfaces, precisely collimates all light beams from the UVLED to a preset divergence angle of 6 deg and provides an adjustable lithography coherent factor. The final illumination system offers a square illumination field with a uniformity of up to 1.3% in the large coherent factor and a linearly adjustable numerical aperture in the range of 0.02 ∼ 0.04. The final exposure result of 0.7 μm based on the experiment setup further verifies the performance of the designed illumination system.

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Section: Introductionmentioning

confidence: 99%

Compact ultraviolet light-emitting diode-based lithography illumination system with tunable coherent factor

Liu

2023

Opt. Eng.

View full text Add to dashboard Cite

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Design of Uniform Illumination Optical Source with 365 nm LED and Application in Lithography

Cited by 1 publication

References 0 publications

Compact ultraviolet light-emitting diode-based lithography illumination system with tunable coherent factor

Compact ultraviolet light-emitting diode-based lithography illumination system with tunable coherent factor

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