Design of Release Interface for UV-NIL Material

Abstract

Release interface between UV-NIL resists and quartz mold was investigated focusing on surface energy and elastic modulus of resist film in order to improve release property of UV-NIL process. The resist with fluorine monomer and with non-reactive fluorine anti-sticking agent were compared by separation force measurements and surface analyses of release interface. The results indicated that resist design has the capability to both reduce the separation force and maintain a clear mold surface. The mold release agent decomposed with increasing number of imprint shots, but the low release force resist with non-reactive anti-stacking agent was able to control the degradation of mold release agent and thus improve release property endurance. In addition, resists with various acrylate monomer structures and formulations were studied in terms of elastic modulus of UV cured resist film. It is found that the separation force can also be controlled by resist elastic modulus without depending on the effect of anti-sticking agent.

The Molded Mask Method: The Origin of Nanoimprint Lithography

“…However, precise replication of complicated patterns over a wide area is not easy. Current nanoimprint lithography has recently progressed significantly [18][19][20][21][22][23][24][25][26][27]. Very small patterns can be replicated and practical applications in the manufacture of devices and components is widespread.…”