The shortwave infrared (SWIR) spectrum near 1550 nm plays a significant role in photonics for autonomous vehicles because of the high atmospheric transmission and eye safety concerns. However, the co-integration of vis and infrared (IR) photodetectors for multispectral detection is limited by sensitivity, which drastically decreases for IR as the pixel pitch is reduced for highresolution. In this regard, beyond vis photodetection has been extensively investigated based on group IV and III-V semiconductors, as well as 2D materials. [5][6][7][8] The relatively low optical absorption of 2D semiconductors precludes achieving high photoresponsivity across a broad spectrum range in 2D/2D van der Waals (vdW) heterostructures, especially in the infrared range, for which a long penetration depth is preferred. [9] An alternative strategy for integrating 2D materials with conventional 3D semiconductors has been suggested so that materials with high light absorption coefficients can be used. [10][11][12][13][14] Germanium (Ge) is very promising attributed to its narrow bandgap of ≈0.7 eV. Moreover, optimized Ge design via the ion-implantation process shows great potential for high-speed broadband photodetectors that can be integrated with CMOS designs and processes. [15][16][17][18][19] A vdW 2D/Ge heterostructure with enhanced responsivity in the SWIR range (>1550 nm), while maintaining a relatively simple two-terminal diode configuration, can be pivotal for photodetectors. To achieve improvement, photogenerated carriers can be multiplied via an additional layer on top of the 2D/Ge junction (i.e., double heterojunction, DHJ), resulting in a complicated device configuration with dual bias polarity operations. Moreover, most DHJs are based on a transition metal dichalcogenide (TMDC) design with a lateral structure rather than the vertically stacked structure. This design increases resistance, as well as operates with a back-to-back connected diode that prevents current amplification. Therefore, a vertically stacked structure is desirable for a high-performance DHJ. [20] To address these challenges, herein, we propose a vertically stacked vdW DHJ photodiode (PD) with an ultrawide-bandgap gallium oxide (Ga 2 O 3 ), which has a high electron carrier density and a hole density close to zero at room temperature. [21] Moreover, Ga 2 O 3 is transparent to vis-IR spectral ranges. The n-Ga 2 O 3 is adopted as an electron reservoir to amplify the photogenerated carriers to improve performance. We investigate the