2017
DOI: 10.1016/j.diamond.2017.08.003
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Design of a normally-off diamond JFET for high power integrated applications

Abstract: Normally-on (depletion mode) and normally-off (enhancement mode) diamond Junction Field Effect Transistors (JFETs) have been analyzed by means of a commercially available TCAD software. First, the parameters used for describing the incomplete ionization, avalanche, and mobility models in diamond have been discussed and assessed against the state-of-the-art. The on- and off-state electrical characteristics of diamond JFETs have been simulated with the suggested parameter values and matched with a set of availab… Show more

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Cited by 18 publications
(8 citation statements)
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“…Finally, the Schottky barrier lowering effect was considered. All the models are described in more details in [25,[45][46][47].…”
Section: Tcad Simulations Of Off-state Diamond Diodes With Fmr As Edgmentioning
confidence: 99%
“…Finally, the Schottky barrier lowering effect was considered. All the models are described in more details in [25,[45][46][47].…”
Section: Tcad Simulations Of Off-state Diamond Diodes With Fmr As Edgmentioning
confidence: 99%
“…NA=NA0 for NA0≥ NAcritic and ND=ND0 when ND0≥ NDcritic). In the formulas (1), the variation of the activation energy due to the Poole-Frenkel effect has been neglected whilst the Pearson and Bardeen formula which accounts for a reduction of the activation energy at high doping concentration has been considered, as in [21]. The equilibrium concentrations in a semiconductor bulk region can be evaluated by finding the Fermi energy level EF (EFN=EFP=EF at the equilibrium) which simultaneously satisfies the charge neutrality condition (n+NA=p+ND) for electrons (n) and holes (p) and the equations (1a) and (1b).…”
Section: A Theory Of the Incomplete Ionizationmentioning
confidence: 99%
“…Методика количественного анализа концентрации атомов примеси в структурах алмаза оказалась очень востребованной в последнее время для послойного анализа монокристаллических пленок алмаза с дельта-слоями бора. Такие структуры рассматриваются как новый перспективный материал для современной микроэлектроники [3][4][5][6][7]. Для послойного анализа дельта-слоев требуется сочетание нескольких факторов: высокого разрешения по глубине, высокой элементной чувствительности и большого динамического диапазона регистрируемой концентрации, что не всегда достигается в экспериментах.…”
Section: поступило в редакцию 17 ноября 2017 гunclassified