2015
DOI: 10.1109/ted.2015.2446954
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Design of 1.2 kV Power Switches With Low <inline-formula> <tex-math notation="LaTeX">$R_{\mathrm{{\scriptscriptstyle ON}}}$ </tex-math></inline-formula> Using GaN-Based Vertical JFET

Abstract: Two novel gallium nitride-based vertical junction FETs (VJFETs), one with a vertical channel and the other with a lateral channel, are proposed, designed, and modeled to achieve a 1.2 kV normally OFF power switch with very low ON resistance (R ON ). The 2-D drift diffusion model of the proposed devices was implemented using Silvaco ATLAS. A comprehensive design space was generated for the vertical channel VJFET (VC-VJFET). For a well-designed VC-VJFET, the breakdown voltage (V BR ) obtained was 1260 V, which i… Show more

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Cited by 59 publications
(7 citation statements)
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“…For example, in VJFETs, the Mg doping level in p-GaN needs to be uniform and high enough to pinch off the channel without any bias, leading to a normally-off operation. 10 However, such variation in the Mg concentration cannot be characterized by secondary ion mass spectroscopy (SIMS), due to its lateral spatial resolution limitation. In this work, cathodoluminescence (CL) spectroscopy was used to investigate the optical properties of p-GaN in a mesa structure.…”
mentioning
confidence: 99%
“…For example, in VJFETs, the Mg doping level in p-GaN needs to be uniform and high enough to pinch off the channel without any bias, leading to a normally-off operation. 10 However, such variation in the Mg concentration cannot be characterized by secondary ion mass spectroscopy (SIMS), due to its lateral spatial resolution limitation. In this work, cathodoluminescence (CL) spectroscopy was used to investigate the optical properties of p-GaN in a mesa structure.…”
mentioning
confidence: 99%
“…3 × 10 16 cm −3 ) could result in a much higher off-state leakage current (not shown) due to the shrunken depletion region in the n-doped region. Hence, the electron concentration N n− of 1 × 10 16 cm −3 is used for n-GaN, which is the same as that used in the literature [12,16,17]. For the top p-GaN, as shown in figure 3, the increase of N p (i.e.…”
Section: Device Structure and Operation Mechanismmentioning
confidence: 99%
“…The SWITCHES program has been very successful demonstrating the fabrication of high power diodes but the ultimate goal of the program is to produce a high voltage (1200V), high current (100A), normally-off vertical transistor. In the SWITCHES program, several novel vertical GaN transistor device structures have been modeled to achieve a 1.2 kV normally-off operation with very low on resistance (17) (18). As a step towards normally-off devices, normally-on vertical transistor structures have been fabricated on bulk GaN substrates with blocking voltages in the range of 600-1200V and currents in the range of 1-10A (19).…”
Section: Gan Power Devicesmentioning
confidence: 99%