2011
DOI: 10.1016/j.mee.2011.02.048
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Design, fabrication and characterization of phase masks for astronomical applications

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Cited by 8 publications
(8 citation statements)
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“…Electron beam lithography (EBL) represents a powerful tool to generate this kind of structure, due to the possibility to realize continuous surface profiles, high flexibility in the elements design, and good optical quality of the fabricated reliefs [12,[22][23][24]. In a recent paper [24] we presented a fabrication technique to obtain millimeter-sized SPPs by means of EBL working at 100 keV in high-speed writing mode, using high currents (tens of nA) and large beam diameters (tens of nm).…”
Section: Theorymentioning
confidence: 99%
See 1 more Smart Citation
“…Electron beam lithography (EBL) represents a powerful tool to generate this kind of structure, due to the possibility to realize continuous surface profiles, high flexibility in the elements design, and good optical quality of the fabricated reliefs [12,[22][23][24]. In a recent paper [24] we presented a fabrication technique to obtain millimeter-sized SPPs by means of EBL working at 100 keV in high-speed writing mode, using high currents (tens of nA) and large beam diameters (tens of nm).…”
Section: Theorymentioning
confidence: 99%
“…In a recent paper [24] we presented a fabrication technique to obtain millimeter-sized SPPs by means of EBL working at 100 keV in high-speed writing mode, using high currents (tens of nA) and large beam diameters (tens of nm). In the present work we suggest a novel process realized in high resolution, where careful inspection of exposure parameters along with accurate proximity effect correction and optimization of developing conditions, allows for obtaining SPPs of superior optical quality.…”
Section: Theorymentioning
confidence: 99%
“…[22][23][24] In a recent paper, 25 we presented a fabrication technique based on EBL working at 100 keV in high-speed writing mode, where we made use of high currents (tens of nA) and large beam diameters (tens of nms) to obtain millimeter-sized SPPs. They are constructed from a piece of transparent material with gradually increasing, spiraling thickness.…”
Section: Fabrication With Electron Beam Lithographymentioning
confidence: 99%
“…The mechanical and optical properties of PMMA slide allow direct use as transmission phase mask in the OVC setup. Two different phase masks are available 12 : the first is tailored to work at 532 nm, the second one at 633 nm; the number of steps of both masks is 512. These wavelengths have been selected for simplicity of instrument alignments, since these are common laser lines.…”
Section: Description Of Aqueye Plusmentioning
confidence: 99%