Design and Theoretical Analyses of Tip–Insulator–Metal Structure with Bottom–Up Light Illumination: Formations of Elongated Symmetrical Plasmonic Hot Spot at Sub-10 nm Resolution

Zhou, Jie; Wang, Changtao; Zhao, Zeyu; Wang, Yanqin; He, Jiangyan; Xing, Tao; Luo, Xiangang

doi:10.1007/s11468-013-9511-4

Cited by 5 publications

(2 citation statements)

References 22 publications

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“…Those LSP hot spots usually behave like dipoles and show non-symmetrical spots with different lateral sizes in two orthogonal directions, especially at positions slightly away from bowtie structures. Some modified structure for apertureless tip lithography is proposed to solve the above problems, as shown in Figure 19 a,b [ 85 ]. The tip, photoresist and metallic layer form a tip–insulator–metal (TIM) structure, in which a highly confined mode of plasmonic light both in the transversal and longitude directions occurs, with normal light illumination beneath the substrate.…”

Section: Plasmonic Direct Writing Lithographymentioning

confidence: 99%

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Plasmonic Structures, Materials and Lenses for Optical Lithography beyond the Diffraction Limit: A Review

et al. 2016

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The rapid development of nanotechnologies and sciences has led to the great demand for novel lithography methods allowing large area, low cost and high resolution nano fabrications. Characterized by unique sub-diffraction optical features like propagation with an ultra-short wavelength and great field enhancement in subwavelength regions, surface plasmon polaritons (SPPs), including surface plasmon waves, bulk plasmon polaritons (BPPs) and localized surface plasmons (LSPs), have become potentially promising candidates for nano lithography. In this paper, investigations into plasmonic lithography in the manner of point-to-point writing, interference and imaging were reviewed in detail. Theoretical simulations and experiments have demonstrated plasmonic lithography resolution far beyond the conventional diffraction limit, even with ultraviolet light sources and single exposure performances. Half-pitch resolution as high as 22 nm (~1/17 light wavelength) was observed in plasmonic lens imaging lithography. Moreover, not only the overview of state-of-the-art results, but also the physics behind them and future research suggestions are discussed as well.

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Section: Plasmonic Direct Writing Lithographymentioning

confidence: 99%

“… Schematic of nanolithography with ( a ) tip–insulator–metal and ( b ) tip–insulator structures; Simulated electric field intensity distribution of ( c ) tip–insulator–metal and ( d ) tip–insulator structures. Reproduced from [ 85 ], Copyright © 2013, Springer. …”

Section: Figurementioning

confidence: 99%