Design and performance of an X-ray scanning microscope at the Hard X-ray Nanoprobe beamline of NSLS-II

Nazaretski, Evgeny; Yan, Hongyuan; Lauer, Kenneth; Bouet, Nathalie; Huang, Xiaojing; Xu, Weihe; Zhou, Juan; Shu, Deming; Hwu, Y.; Chu, Yong S.

doi:10.1107/s1600577517011183

Cited by 96 publications

(77 citation statements)

References 32 publications

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“…The wafer was scanned across a 12 keV nano-focused x-ray beam produced by MLLs. Details of the experimental setup can be found in [38,39]. The front surface of the sample was placed 10 µm downstream from the focal plane to provide adequate overlapping condition with a diverged beam [40][41][42].…”

Section: Resultsmentioning

confidence: 99%

Extending the depth of field for ptychography using complex-valued wavelets

Huang¹,

Yan²,

Robinson³

et al. 2019

Opt. Lett.

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Ptychography is a scanning variation of the coherent diffractive imaging method for providing highresolution quantitative images from specimen with extended dimensions. Its capability of achieving diffraction-limited spatial resolution can be compromised by the sample thickness, which is generally required to be thinner than the depth of field of the imaging system. In this study, we present a method to extend the depth of field for ptychography by numerically generating the focus stack from reconstructions with propagated illumination wavefronts and combining the in-focus features to a single sharp image using an algorithm based on the complex-valued discrete wavelet transform. This approach does not require repeated measurements by translating the sample along the optical axis as in the conventional focus stacking method, and offers a computation-efficient alternative to obtain high-resolution images with extended depth of field, complementary to the multi-slice ptychography.

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Section: Resultsmentioning

confidence: 99%

Extending the depth of field for ptychography using complex-valued wavelets

Huang¹,

Yan²,

Robinson³

et al. 2019

Opt. Lett.

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“…At 12 keV, the focal lengths f of these two lenses are 5.2 mm and 4.2 mm, respectively, and the DoF defined by the NA is λ∕NA 2 λ2f ∕A 2 3.9 μm. The HXN microscope is designed to conduct high-resolution multi-modal scanning probe measurements using MLLs [41][42][43][44]. To create a diffraction-limited point focus, the crossed MLL pair has to be aligned better than the DoF along the longitudinal direction [45] and with an orthogonality better than 0.01° [46].…”

Section: Resultsmentioning

confidence: 99%

Multi-slice ptychography with large numerical aperture multilayer Laue lenses

Öztürk¹,

Yan²,

He³

et al. 2018

Optica

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The highly convergent x-ray beam focused by multilayer Laue lenses with large numerical apertures is used as a threedimensional (3D) probe to image layered structures with an axial separation larger than the depth of focus. Instead of collecting weakly scattered high-spatial-frequency signals, the depth-resolving power is provided purely by the intense central cone diverged from the focused beam. Using the multi-slice ptychography method combined with the on-the-fly scan scheme, two layers of nanoparticles separated by 10 μm are successfully reconstructed with 8.1 nm lateral resolution and with a dwell time as low as 0.05 s per scan point. This approach obtains high-resolution images with extended depth of field, which paves the way for multi-slice ptychography as a high throughput technique for high-resolution 3D imaging of thick samples.

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“…These techniques enjoyed fast development in the last few decades alongside advancements in third and fourth generation synchrotron radiation facilities [6][7][8] and dedicated focusing X-ray optics. [9][10][11] Modern synchrotron beamlines produce a spatially and temporary coherent X-ray flux of 10 8 photons per second that can be focused down to 10 nm, 12 providing the possibility to resolve the structure of materials with high-resolution using probing techniques such as scanning X-ray diffraction mapping 13 and Bragg coherent diffractive imaging (BCDI). [14][15][16][17] Especially noticeable is the ability of such techniques to resolve volumetric strain distribution and evolution in individual and extended nanostructures.…”

Section: Introductionmentioning

confidence: 99%