Design and Implementation of Remote Plasma Sources for Semiconductor Chamber Cleaning

Transformer coupled toroidal wave-heated remote plasma sources operating in Ar/NF3 mixtures

“…Remote plasma sources (RPSs) facilitate the production of neutral radicals for use in materials processing reactors while 3 Present address: University of Aberdeen, King's College, Fraser Noble 158, Aberdeen, AB24 3FX, United Kingdom. * Author to whom any correspondence should be addressed.…”

“…These designs result in radical fluxes to the substrate having a low charged particle fraction. RPSs are employed for chamber cleaning [3][4][5], photoresist stripping [6][7][8], isotropic chemical etching [9][10][11][12], atomic layer etching [13,14], atomic layer deposition [15,16], and chemical vapor deposition [17,18]. RPSs are increasingly being investigated for use in selective isotropic etching processes, and particularly for the manufacture of horizontally stacked nano wires and gate-all-around architectures [11,19].…”