Design and implementation of a novel portable atomic layer deposition/chemical vapor deposition hybrid reactor

Abstract

We report the development of a novel portable atomic layer deposition chemical vapor deposition (ALD/CVD) hybrid reactor setup. Unique feature of this reactor is the use of ALD/CVD mode in a single portable deposition system to fabricate multi-layer thin films over a broad range from "bulk-like" multi-micrometer to nanometer atomic dimensions. The precursor delivery system and control-architecture are designed so that continuous reactant flows for CVD and cyclic pulsating flows for ALD mode are facilitated. A custom-written LabVIEW program controls the valve sequencing to allow synthesis of different kinds of film structures under either ALD or CVD mode or both. The entire reactor setup weighs less than 40 lb and has a relatively small footprint of 8 × 9 in., making it compact and easy for transportation. The reactor is tested in the ALD mode with titanium oxide (TiO2) ALD using tetrakis(diethylamino)titanium and water vapor. The resulting growth rate of 0.04 nm/cycle and purity of the films are in good agreement with literature values. The ALD/CVD hybrid mode is demonstrated with ALD of TiO2 and CVD of tin oxide (SnOx). Transmission electron microscopy images of the resulting films confirm the formation of successive distinct TiO2-ALD and SnO(x)-CVD layers.

Collagen Membranes Functionalized with 150 Cycles of Atomic Layer Deposited Titania Improve Osteopromotive Property in Critical-Size Defects Created on Rat Calvaria

“…In this work, atomic layer deposition (ALD) was used for all thin film depositions based on the previous publications [ 23 , 29 , 30 , 31 ].…”

Is atomic layer deposition of silver possible on N95 masks?

“…N95 mask from 3M was cut into ∼4 cm × 2 cm pieces and used as received. All ALD processes were carried out in a custom-built ALD reactor and in all experiments silicon wafer from WAFERPRO (item number: C04007) was used as a control sample [23] . A photograph and schematic of the linings representation of the ALD system is shown in Fig.…”

“…Yet, such masks are not intended as personal protective equipment (PPE) for healthcare providers in clinical settings where the infection risk level is high (e.g., high inhalation exposure or aerosol-generating procedures), do not provide liquid barrier protection, and are not substitutes for filtering face piece respirators or surgical face masks. The aims of the proposed study were: to conduct the functionalization of N95 respirators by using ALD Ag with a recently patented ALD system [23] , [24] achieving nanometer length scale films; to characterize the functionalized samples chemically and morphologically; to obtain process – structure – performance inter-relationships of the resulting systems; and to study the antimicrobial properties of the functionalized samples.…”

Design and Operation of an Optically-Accessible Modular Reactor for Diagnostics of Thermal Thin Film Deposition Processes

“…Therefore, we designed a modular reactor to emulate the deposition characteristics and optical access of the previous design, yet be small and simple enough to be easily manufactured, ported and mounted on an optical table – thereby allowing it to act as a modular component in an optical train. Previous publications have demonstrated the capability of the reactor to deposit device quality oxides using ALD [ 11 ] and to operate in either an ALD or chemical vapor deposition configuration [ 12 ]. However, a detailed report on the design and operation of the reactor has not been published.…”