2022
DOI: 10.1364/oe.453164
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Design and fabrication of ridge waveguide-based nanobeam cavities for on-chip single-photon sources

Abstract: We report on the design of nanohole/nanobeam cavities in ridge waveguides for on-chip, quantum-dot-based single-photon generation. Our design overcomes limitations of a low-refractive-index-contrast material platform in terms of emitter-mode coupling efficiency and yields an outcoupling efficiency of 0.73 to the output ridge waveguide. Importantly, this high coupling efficiency is combined with broadband operation of 9 nm full-width half-maximum. We provide an explicit design procedure for identifying the opti… Show more

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Cited by 5 publications
(3 citation statements)
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“…Building on this foundation, the integration of two 1D distributed Bragg reflectors (DBRs) to form a nanobeam cavity further underscored the improved coupling efficiency achieved through careful cavity parameter design. This advancement was theoretically investigated on both the GaAs/AlGaAs [20] and GaAs-on-insulator (GaAsOI) platforms [21]. The latter, characterized by its high refractive index contrast that obviates the need for deep etching, combined with stronger optical confinement, theoretically enables near-unity coupling efficiency through careful cavity parameter design [21].…”
Section: Introductionmentioning
confidence: 99%
“…Building on this foundation, the integration of two 1D distributed Bragg reflectors (DBRs) to form a nanobeam cavity further underscored the improved coupling efficiency achieved through careful cavity parameter design. This advancement was theoretically investigated on both the GaAs/AlGaAs [20] and GaAs-on-insulator (GaAsOI) platforms [21]. The latter, characterized by its high refractive index contrast that obviates the need for deep etching, combined with stronger optical confinement, theoretically enables near-unity coupling efficiency through careful cavity parameter design [21].…”
Section: Introductionmentioning
confidence: 99%
“…In this context, the spatially controlled integration of single QDs with nanometer precision into optical and plasmonic devices is crucial for the development of on-chip single-photon sources. In the past few years, scientists have tried to achieve this result by employing different technologies using molecular beam epitaxy , or in situ electron beam lithography. A different and successful approach consists in the incorporation of QDs into photopolymerizable resins, allowing for the precise location of QDs and the integration of single nanoemitters into optical and plasmonic devices, by using two-photon lithography. ,, This is a faster and use-friendly single-step process, as it does not require an electron-collimated beam or vacuum technology while managing to precisely locate QDs in a three-dimensional volume, on whichever kind of substrate.…”
Section: Introductionmentioning
confidence: 99%
“…Applying this strategy, the coupling efficiency from an InAs QD to a bare GaAs ridge waveguide located on the top of a low index silica substrate has achieved ∼60% [28]. Recently, researchers presented a rectangular distributed Bragg reflector (DBR) holes-based SPS featuring an efficiency of 86% [29], and a value of 73% in a circular-hole DBR device [30]. Nevertheless, realizing a near-unity efficiency comparable to the state-of-the-art micropillar or PC waveguide SPS in semiconductor ridge waveguide platform is still of critical importance and under pursuit.…”
Section: Introductionmentioning
confidence: 99%