2001
DOI: 10.1364/ao.40.000211
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Design and fabrication of a hybrid diffractive optical device for multiple-line generation over a wide angle

Abstract: A new hybrid optical device that is capable of splitting a monochromatic laser beam into an arbitrary number of lines over a wide angle is presented. It consists of a binary surface-relief computer-generated phase hologram and a continuous parabolic surface-relief grating. In this device the phase hologram serves to generate three small, parallel lines while the continuous parabolic surface-relief phase grating acts as an array of diverging parabolic lenses to widen these lines. The binary surface-relief was g… Show more

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Cited by 13 publications
(4 citation statements)
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“…Lithographical processes are conventionally used in making diffractive gratings and even hybrid diffractive phase element for line generator [14] but they lack the ability to pattern three-dimensional surfaces. In this work, we attempt to overcome this limitation by generating diffractive gratings on a cylindrical lens array with ultra-precision diamond machining.…”
Section: Introductionmentioning
confidence: 99%
“…Lithographical processes are conventionally used in making diffractive gratings and even hybrid diffractive phase element for line generator [14] but they lack the ability to pattern three-dimensional surfaces. In this work, we attempt to overcome this limitation by generating diffractive gratings on a cylindrical lens array with ultra-precision diamond machining.…”
Section: Introductionmentioning
confidence: 99%
“…A pure-phase CGH (or kinoform) is a hologram whose amplitude is constant, and this kind of hologram has a high light efficiency. As a result, research on kinoform has drawn much attention [3,4].…”
Section: Introductionmentioning
confidence: 99%
“…Among the several applications of MLAs one can find: in the enhancement of the efficiency of detector arrays (1); in the fabrication of optical components with non-Gaussian imaging properties (2); they are also of interest in digital optical processing where they might be used in array illuminators (3), in various forms as interconnects, in couplers and multiplexers with optical fibers, in retro-reflective screens and to sampling an optical wavefront for adaptive optics and Shack-Hartmann wavefront sensors (4). There are several techniques to implement microlens array such as photoresist melting (5-8), e-beam lithography (9), grayscale lithography (10), optical lithography operating in proximity mode (11,12), UV exposure directly on photosensitive hybrid glass (13,14), anisotropic etching of silicon in a KOH water solution (15), among others. Each technique has its advantages and limitations.…”
Section: Introductionmentioning
confidence: 99%