Design and Fabrication of a patterned dual colour filter using Microwave plasma assisted Sputtering and Photolithography

Pomfret, Jonathan; Cai, Sijia; Han, Daxing; Gibson, D. R.; Song, Shigeng; Hutson, David; Mackay, Peter

doi:10.1364/oic.2022.md.8

Optical Interference Coatings Conference (OIC) 2022 2022

DOI: 10.1364/oic.2022.md.8

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Design and Fabrication of a patterned dual colour filter using Microwave plasma assisted Sputtering and Photolithography

Jonathan Pomfret

Sijia Cai

Daxing Han

et al.

Abstract: A patterned dual colour filter has been deposited by microwave plasma assisted pulsed DC sputtering (MPAS) and photolithography. Compatibility between MPAS and photolithography for fabrication of patterned optical filters has been demonstrated.

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Design and Fabrication of a patterned dual colour filter using Microwave plasma assisted Sputtering and Photolithography

Abstract: A patterned dual colour filter has been deposited by microwave plasma assisted pulsed DC sputtering (MPAS) and photolithography. Compatibility between MPAS and photolithography for fabrication of patterned optical filters has been demonstrated.

Cited by 0 publications

References 8 publications

No citations

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