2013
DOI: 10.3788/ope.20132103.0590
|View full text |Cite
|
Sign up to set email alerts
|

Design and epitaxial growth of quantum-well for 852 nm laser diode

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
0
0

Year Published

2017
2017
2022
2022

Publication Types

Select...
4

Relationship

0
4

Authors

Journals

citations
Cited by 4 publications
(1 citation statement)
references
References 0 publications
0
0
0
Order By: Relevance
“…Compared with silicon (Si), germanium (Ge), gallium arsenide (GaAs), and indium phosphide (InP), hexagonal boron nitride (h-BN), as a third-generation semiconductor, is a two-dimensional III-V group semiconductor material with excellent properties such as wide band gap, high hardness, high thermal conductivity, and corrosion resistance, which are generally used in high-frequency communication, electrical energy conversion, etc. [2][3][4][5]. These advantages allow the application of boron nitride for the production of devices suitable for extreme environments (such as outer space) that still function, such as deep-ultraviolet band light-emitting devices [6][7][8][9][10].…”
Section: Introductionmentioning
confidence: 99%
“…Compared with silicon (Si), germanium (Ge), gallium arsenide (GaAs), and indium phosphide (InP), hexagonal boron nitride (h-BN), as a third-generation semiconductor, is a two-dimensional III-V group semiconductor material with excellent properties such as wide band gap, high hardness, high thermal conductivity, and corrosion resistance, which are generally used in high-frequency communication, electrical energy conversion, etc. [2][3][4][5]. These advantages allow the application of boron nitride for the production of devices suitable for extreme environments (such as outer space) that still function, such as deep-ultraviolet band light-emitting devices [6][7][8][9][10].…”
Section: Introductionmentioning
confidence: 99%