2018
DOI: 10.1088/2053-1591/aaed10
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Design and development of nanoimprint-enabled structures for molecular motor devices

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Cited by 6 publications
(5 citation statements)
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“…Therefore, in the case of interest, the imprinting temperature must be higher than the glass transition temperature (T Impr > T g ). There are articles [53,54] describing the processes in which intermediate IPS stamps were prepared at temperatures well in excess of the glass transition temperature T Impr ≥ 160 • C and at pressures P Impr ≥ 40 bar; under such conditions, it was possible to reach a better filling of the master-stamp micro-and nanorelief with the polymer. In the present work, it was required not only to create a deep (>10 µm) imprint in the IPS but, also, to press a dense array of metal strips into the substrate.…”
Section: D Shaping Methodsmentioning
confidence: 99%
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“…Therefore, in the case of interest, the imprinting temperature must be higher than the glass transition temperature (T Impr > T g ). There are articles [53,54] describing the processes in which intermediate IPS stamps were prepared at temperatures well in excess of the glass transition temperature T Impr ≥ 160 • C and at pressures P Impr ≥ 40 bar; under such conditions, it was possible to reach a better filling of the master-stamp micro-and nanorelief with the polymer. In the present work, it was required not only to create a deep (>10 µm) imprint in the IPS but, also, to press a dense array of metal strips into the substrate.…”
Section: D Shaping Methodsmentioning
confidence: 99%
“…Addition of a second resonator layer expands the capabilities in controlling the polarization and intensity of transmitted radiation thanks to the increased number of elements and increased surface fill factor, as well as due to the ability to fabricate structures with different separations between the layers. Two-and multi-layer resonator systems [26,27,31,[52][53][54][58][59][60] are known to be efficient converters of electromagnetic radiation. Additional layers into the system can lead to various phenomena such as Fabry-Perot resonances, and the shift and splitting of fundamental resonances due to the near-field interaction.…”
Section: D Shaping Methodsmentioning
confidence: 99%
“…mask-based patterning in the ultraviolet (UV) or extreme ultraviolet (EUV) spectral range; or nanoimprint lithography (NIL) is a better choice. Whereas EBL is still needed to create the mask for (E)UV lithography or the master stamp for NIL [70,71], the modular network design offers ways to employ these technologies both for the fabrication of multiple identical networks and individual modular networks.…”
Section: Fabricationmentioning
confidence: 99%
“…Parallel nanofabrication techniques could be considered such as extreme UV lithography (UVL) [41], or nanoimprint lithography [42,43], which both enable a higher fabrication throughput of larger devices, while still maintaining a high resolution.…”
Section: N2 High-throughput Nanofabrication Technologymentioning
confidence: 99%