Design and Deposition of Infrared Antireflection Protection Film on Magnesium Fluoride Substrate for 3~5 μm

Abstract

The infrared antireflection protection film is designed and deposited on magnesium fluoride substrate for 3~5 μm. The multilayer antireflection film is designed and prepared by ion beam assisted electron-beam deposition. After repeated experiments, the absorption peak of SiO2 is found at 3000nm,using MgF2 and SiO2 as the low-index materials to reduce the absorption. The coating structure is Sub|1.46H1.37L2.19H1.45L2.49M|Air. DLC (diamond-like carbon) protection coating is deposited by radio frequency plasma enhanced chemical vapor deposition (RF-PECVD). Through contrast tests, the best deposition process is obtained (the butane flow rate is 5sccm/s, deposition temperature is 80°C) by setting deposition time as invariant, the reaction gas flow rate and deposition temperature as variables. Meanwhile the problem of associativity between antireflection film and DLC protection coating is solved by adding a Si transition layer. The result shows that the average transmittance of this film in 3~5μm is 95.5%, and this film can withstands harsh environment tests. Key words: Magnesium fluoride substrate; Antireflection protection film; 3~5 μm infrared band Document Code: A Article ID: DIO