In this article, starting from a critical review, an original study is made of the causes and nature of the behavior of the current density of charge carriers and of nano and microstructures, respectively, through and on a layer under construction on a metallic surface (for example: titanium), when subjected to anodizing engineering. Here, the causality proposal for the behavior of the current and the nano and microstructures is improved, broader and more accurate in relation to the others already existing in scientific publications. In this sense, the causes show that the presence of nano and microstructures on the layer under construction is not a necessary or sufficient condition to always influence the behavior of the current density through this layer. The presence of such nano and microstructures, which influence the behavior of the current, is a strictly particular case and is achieved by adjusting some anodizing parameters (voltage, time, type of electrolyte, etc.). Thus, the main cause for the current behavior is the lifting of a potential effective barrier resulting from the interactions between charge carriers during the anodizing process and not only the nano and microstructures, as has been stated in recent scientific publications in this area.