Deposition rate and thickness uniformity of thin films deposited by a pulsed cathodic arc process

Fuchs, H.; Engers, B; Hettkamp, E.; Mecke, H.; Schultz, James J.

doi:10.1016/s0257-8972(01)01114-8

Cited by 15 publications

(3 citation statements)

References 8 publications

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“…This was associated with increasing heat input. It was originally envisaged that increased corrosion resistance might be achieved through the use of pulsed arc technology, which may provide enhanced barrier layer performance for such coatings [16,20,21], thus providing the focus for this study.…”

Section: Discussionmentioning

confidence: 99%

Studies on the Effect of Arc Current Mode and Substrate Rotation Configuration on the Structure and Corrosion Behavior of PVD TiN Coatings

2017

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Thin, hard cathodic arc evaporated (CAE) metal nitride coatings are known to contain defects such as macro-particles, pinholes, voids and increased porosity, leading to reduced corrosion resistance. The focus of this research investigation was to compare the structure and corrosion behaviour of cathodic arc evaporated (CAE) TiN coatings deposited on AISI 1020 low carbon steel substrates using a pulsed current arc and a more conventional constant current arc source (DC). The effects of a double (2R) and triple (3R) substrate rotation configuration were also studied. Coating morphology and chemical composition were characterised using optical, SEM imaging and XRD analysis. Focus variation microscopy (FVM), an optical 3D measurement technique, was used to measure surface roughness. Corrosion studies were carried out using potentiodynamic scanning in 3.5% NaCl. Tafel extrapolation was carried out to determine E corr and I corr values for the coated samples. In general, increased surface roughness, and to a certain extent, corrosion resistance, were associated with thicker coatings deposited using 2R, compared to 3R rotation configuration. The arc source mode (continuous or pulsed) was shown to have little effect on the corrosion behavior. Corrosion behavior was controlled by the presence of defects, pinholes and macro-particles at lower anodic potentials, while the formation of large pitted regions and aggressive corrosion of the underlying substrate was observed at higher anodic potentials.

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Section: Discussionmentioning

confidence: 99%

Studies on the Effect of Arc Current Mode and Substrate Rotation Configuration on the Structure and Corrosion Behavior of PVD TiN Coatings

2017

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“…The cathodic arc deposition technology is one of the most efficient PVD techniques and green manufacturing process [1][2][3][4][5][6]. Based on this technique a novel concept with the advantages of pulsed current input of the cathodic arc sources has been developed with the purpose of coating systems improvement in comparison with conventional arc deposited coatings.…”

Section: Introductionmentioning

confidence: 99%

Cathodic Arc Deposited CrAlSiN Coatings by Pulsed Current Input

Huang¹,

Hsu²,

Ho³

2017

dteees

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Abstract. Cathodic arc deposition technique is one of the green processes of the physical vapor deposition (PVD) systems. In this study, Cr and CrAlSi dual metal targets were used in order to synthesize CrAlSiN coatings. By using the cathodic arc pulsed current techniques, three different settings of pulsed current duty cycles were used. The microstructure of the coatings observed by XRD analysis shows all the coatings are B1-Rock salt structure with diffraction peaks of (111) and (200). The pulsed current input as compared to the constant current had presented the higher hardness up HV3771. Corrosion test by polarization method shows the best corrosion resistance of the CrAlSiN was achieved by pulsed current input at high cycle time.

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“…The investigations described in the following refer to cathodic arc deposition 1. The modified pulsed arc process2,3 leads to an improved target use and to an increase in the mean ion current at the substrate resulting in an increased deposition rate 4,5. The still too high droplet emission in comparison to the steered arc and the undefined start position of the spots at the beginning of the pulse have to be regarded as disadvantages.…”

Section: Introductionmentioning

confidence: 99%

Influence of the Modified Pulsed Arc Process by Variable Magnetic Fields

Hettkamp

Lindemann

2007

Plasma Process. Polym.

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The modified pulsed arc process is characterised by two different process phases: the current pulses mainly determine process results while during the base current phase discharge is maintained. The utilisation of a variable magnetic field allows us to adapt field strength to the value of the arc current. The control of an external magnetic field during the process combination of steered arc and modified pulsed arc gives additional degrees of freedom. For example, it has been observed that the utilisation of a variable magnetic field synchronised with the arc current led to an increase of the deposition rate in comparison with a permanent magnetic field. The disadvantage of a reduced deposition rate when using permanent magnetic fields can be compensated by the synchronisation of the magnetic field with the pulsed arc current.

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Deposition rate and thickness uniformity of thin films deposited by a pulsed cathodic arc process

Cited by 15 publications

References 8 publications

Studies on the Effect of Arc Current Mode and Substrate Rotation Configuration on the Structure and Corrosion Behavior of PVD TiN Coatings

Studies on the Effect of Arc Current Mode and Substrate Rotation Configuration on the Structure and Corrosion Behavior of PVD TiN Coatings

Cathodic Arc Deposited CrAlSiN Coatings by Pulsed Current Input

Influence of the Modified Pulsed Arc Process by Variable Magnetic Fields

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