“…In addition to catalysis, reactively sputtered molybdenum nitride thin films have been extensively studied for various applications, including as hard coatings, superconductors, and diffusion barriers for electronic devices. − For these applications, precise control of crystal structure and mechanical and electrical properties is desired, and thus the synthesis mechanism has been well-explored and described. , A variety of structures, including crystalline rocksalt (face-centered cubic lattice, fcc) γ-Mo 2 N, tetragonal β-Mo 2 N, and hexagonal (hex) δ-MoN as well as amorphous and mixed phase films, have been obtained by modification of substrate temperature, nitrogen partial pressure, and target power during sputtering. − Further tuning of lattice parameters, N vacancies, and grain size has also been achieved through variation of O partial pressure and total pressure in the sputter chamber due to the strong relationship between composition and formation energy . However, within a compositional range, similar formation energies and the presence of vacancies allows for the stabilization of several different phases simultaneously within a sample.…”