2003
DOI: 10.1016/s0040-6090(03)00347-x
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Deposition of ZnO thin films by magnetron sputtering for a film bulk acoustic resonator

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Cited by 111 publications
(42 citation statements)
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“…8 There is a significantly vibrant literature on ZnO channel TFTs deposited with different methods such as physical vapor deposition, chemical vapor deposition, chemical solution deposition, molecular beam epitaxy, and atomic layer deposition (ALD). [1][2][3][4][9][10][11][12] The on-to-off current ratios, I on /I off , of these devices range from 10 to 10 8 with reported electron mobility values between 0.031 and 56.43 cm 2 /V-s. 2,[13][14][15][16][17] Among all these techniques, ALD is promising due to the low growth temperature, large area uniformity, precise thickness control, highly conformal deposition, and scalability to roll-to-roll processes. Low temperature processing is very crucial for compatibility with flexible substrates.…”
Section: Introductionmentioning
confidence: 99%
“…8 There is a significantly vibrant literature on ZnO channel TFTs deposited with different methods such as physical vapor deposition, chemical vapor deposition, chemical solution deposition, molecular beam epitaxy, and atomic layer deposition (ALD). [1][2][3][4][9][10][11][12] The on-to-off current ratios, I on /I off , of these devices range from 10 to 10 8 with reported electron mobility values between 0.031 and 56.43 cm 2 /V-s. 2,[13][14][15][16][17] Among all these techniques, ALD is promising due to the low growth temperature, large area uniformity, precise thickness control, highly conformal deposition, and scalability to roll-to-roll processes. Low temperature processing is very crucial for compatibility with flexible substrates.…”
Section: Introductionmentioning
confidence: 99%
“…ZnO was extensively studied over the last decades with the aim of producing high-quality thin films for the fabrication of SAW and FBAR devices (Ferblantier et al, 2005;Huang et al, 2005;Lee et al, 2003). These kinds of devices exploit the piezoelectric properties of their active layers.…”
Section: X-ray Analysis On Zno Thin Filmsmentioning
confidence: 99%
“…Within this context, conventional surface acoustic wave (SAW) filters were gradually replaced by film bulk acoustic resonator (FBAR) devices. Their advantage in comparison with SAW devices resides in a higher quality factor (Lee et al, 2003) and lower fabrication costs (Huang et al, 2005). These kinds of devices are based on piezoelectric materials.…”
Section: Introductionmentioning
confidence: 99%
“…Two types of semiconductor materials that are widely used for this purpose are zinc oxide and stannic oxide [4]. Researchers have used ZnO in different forms, such as thick films, thin films, nanowires, nanoparticles and nanorods, depending on the application [5][6][7][8]. Many researchers are attracted to develop ZnO for monitoring systems due to its low cost, its mature synthesis technology, its tunable properties and large exiton binding (60 eV).…”
Section: B Introductionsmentioning
confidence: 99%