Deposition of ZnO Thin Film at Different Substrate Temperature Using RF Sputtering for Growth of ZnO Nanorods Using Hydrothermal Method for UV Detection

Sannakashappanavar, Basavaraj S.; Byrareddy, C. R.; Varma, Sanjit; Pattanshetti, Nandini A.; Yadav, Aniruddh Bahadur

doi:10.1007/978-981-13-9419-5_8

Cited by 2 publications

(1 citation statement)

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“…In sputtering, the target purity and the chamber pressure, i.e. the pressure of the argon gas, plays an important role in the deposition of the seed layer (Sannakashappanavar et al, 2020). The role of chamber pressure is that it effects the sputtering efficiency, while for deposition of ZnO, if the target used is of metallic zinc, the oxygen environment will ensure the deposition of ZnO, moreover, it counteracts the most common defect of oxygen vacancies in the growth of ZnO.…”

Section: Growth Of Seed Layer Via Sputteringmentioning

confidence: 99%

A Review on Synthesis and Optoelectronic Applications of Nanostructured ZnO

2021

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Nanostructured ZnO has gained a lot of interest as a suitable material for various applications, especially sensing, energy conversion, and storage. ZnO nanostructures can be synthesized in several ways. It is one of the materials that can be prepared in a variety of morphologies including hierarchical nanostructures. This review article presents a review of current research activities on the growth of ZnO Nanorods. The article covers various water-based routes of synthesis and is further characterized by the type of substrate used for the growth. The growth factors involved in the hydrothermal and chemical bath deposition methods are discussed. These factors include the variety of precursors, time, temperature, and the seeding method employed. At the end, applications such as gas sensing and improvement in Opto-electric properties are discussed.

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Section: Growth Of Seed Layer Via Sputteringmentioning

confidence: 99%