Deposition of TiO2 thin films using RF magnetron sputtering method and study of their surface characteristics

Heo, Cheol Ho; Lee, Soon-Bo; Boo, Jin‐Hyo

doi:10.1016/j.tsf.2004.08.033

Cited by 160 publications

(73 citation statements)

References 7 publications

Supporting

Mentioning

Contrasting

Unclassified

Order By: Relevance

“…Subsequent heat treatments are therefore required to convert the titania coatings into their photoactive crystalline phases, namely anatase, rutile, and brookite [9]. Of these three TiO 2 polymorphs, the thermodynamically stable rutile and the metastable anatase are the more common forms of titania, with anatase starting to convert irreversibly into rutile upon heat treatment at temperatures between 400°C and 1200°C [9][10][11].…”

Section: Introductionmentioning

confidence: 99%

Conversion of amorphous TiO2 coatings into their crystalline form using a novel microwave plasma treatment

Dang

Rahman

MacElroy

et al. 2011

Surface and Coatings Technology

View full text Add to dashboard Cite

Crystalline titanium dioxide (TiO 2 ) coatings have been widely used in photoelectrochemical solar cell applications. In this study, TiO 2 and carbon-doped TiO 2 coatings were deposited onto unheated titanium and silicon wafer substrates using a DC closed-field magnetron 2 sputtering system. The resultant coatings had an amorphous structure and a post-deposition heat treatment is required to convert this amorphous structure into the photoactive crystalline phase(s) of TiO 2 . This study investigates the use of a microwave plasma heat treatment as a means of achieving this crystalline conversion. The treatment involved placing the sputtered coatings into a 2.45 GHz microwave-induced nitrogen plasma where they were heated to approximately 550°C.It was observed that for treatment times as short as 1 minute, the 0.25-µm thick coatings were converted into the anatase crystalline phase of TiO 2 . The coatings were further transformed into the rutile crystalline phase after treatments at higher temperatures. The doping of TiO 2 with carbon was found to result in a reduction in this phase transformation temperature, with higher level of doping (up to 5.8% in this study) leading to lower anatase-to-rutile transition temperature. The photoactivity performance of both doped and un-doped coatings heat-treated using both furnace and microwave plasma was compared. The carbon-doped TiO 2 exhibited a 29% increase in photocurrent density compared to that observed for the un-doped coating.Comparing carbon-doped coatings heat-treated using the furnace and microwave plasma, it was observed that the latter yielded a 19% increase in photocurrent density. This enhanced performance may be correlated to the differences in the coatings' surface morphology and band gap energy, both of which influence the coatings' photoabsorption efficiency.

show abstract

Section: Introductionmentioning

confidence: 99%

Conversion of amorphous TiO2 coatings into their crystalline form using a novel microwave plasma treatment

Dang

Rahman

MacElroy

et al. 2011

Surface and Coatings Technology

View full text Add to dashboard Cite

show abstract

“…Anatase is metastable and transforms into the rutile at high temperature (ca. 700˝C) [17][18][19][20][21][22]. Rutile is the most stable phase of TiO 2 .…”

Section: Introductionmentioning

confidence: 99%

“…Rutile is the most stable phase of TiO 2 . Titanium dioxide thin films with a rutile phase exhibit high refractive index and good thermal stability [21,22]. According to Lin et al [21], TiO 2 thin films with a dominant rutile phase showed much greater hardness and Young's modulus values than the anatase thin films.…”

Section: Introductionmentioning

confidence: 99%

Influence of Material Composition on Structural and Optical Properties of HfO2-TiO2 Mixed Oxide Coatings

et al. 2016

View full text Add to dashboard Cite

Abstract:In this paper the influence of material composition on the structural, surface and optical properties of HfO 2 -TiO 2 mixed oxide coatings was investigated and discussed. Five sets of thin films were deposited using reactive magnetron sputtering: HfO 2 , TiO 2 and three sets of mixed HfO 2 -TiO 2 coatings with various titanium content. The change in the material composition had a significant influence on the structural, surface and optical properties. All of the deposited coatings, except for (Hf 0.55 Ti 0.45 )O x , were nanocrystalline with crystallites ranging from 6.7 nm to 10.8 nm in size. Scanning electron microscopy measurements revealed that surface of nanocrystalline thin films consisted of grains with different shapes and sizes. Based on optical transmission measurements, it was shown that thin films with higher titanium content were characterized by a higher cut-off wavelength, refractive index and lower optical band gap energy. The porosity and packing density were also determined.

show abstract

“…[7][8][9][10][11][12][13] Titanium dioxide (TiO 2 ) is a potential semiconductor material with wide band gap (∼3 eV) and good adhesion to the glass and plastic substrates. 14,15 It has many excellent physical properties such as a high dielectric constant and a strong mechanical and chemical stability. 16 Due to its high refractive index of about 2.7 and optical transmittance of above 90% in the visible range, TiO 2 a Author to whom correspondence should be addressed.…”

mentioning

confidence: 99%

“…Electronic mail: TA@asu.edu can be used as optical coatings on large area substrates for architectural, automotive and display applications and protective layers for very large-scale integrated circuits. [14][15][16] In this work, the high transparency of TiO 2 in visible region and low resistivity of thin Ag layer lead us to the detailed study of optical and electrical properties of TiO 2 /Ag/TiO 2 (TAT) multilayer as TCEs. The multilayer transparent conductive electrodes have been deposited onto flexible substrates by sputtering at room temperature.…”

mentioning

confidence: 99%

High quality transparent TiO2/Ag/TiO2 composite electrode films deposited on flexible substrate at room temperature by sputtering

Dhar

Alford

2013

APL Materials

View full text Add to dashboard Cite

Multilayer structures of TiO2/Ag/TiO2 have been deposited onto flexible substrates by room temperature sputtering to develop indium-free transparent composite electrodes. The effect of Ag thicknesses on optical and electrical properties and the mechanism of conduction have been discussed. The critical thickness (tc) of Ag mid-layer to form a continuous conducting layer is 9.5 nm and the multilayer has been optimized to obtain a sheet resistance of 5.7 Ω/sq and an average optical transmittance of 90% at 590 nm. The Haacke figure of merit (FOM) for tc has one of the highest FOMs with 61.4 × 10−3 Ω−1/sq.

show abstract

Deposition of TiO2 thin films using RF magnetron sputtering method and study of their surface characteristics

Cited by 160 publications

References 7 publications

Conversion of amorphous TiO2 coatings into their crystalline form using a novel microwave plasma treatment

Conversion of amorphous TiO2 coatings into their crystalline form using a novel microwave plasma treatment

Influence of Material Composition on Structural and Optical Properties of HfO2-TiO2 Mixed Oxide Coatings

High quality transparent TiO2/Ag/TiO2 composite electrode films deposited on flexible substrate at room temperature by sputtering

Contact Info

Product

Resources

About