DEPOSITION OF TiN-BASED COATINGS USING VACUUM ARC PLASMA IN INCREASED NEGATIVE SUBSTRATE BIAS VOLTAGE

Куприн, А.С.; Leonov, S.A.; Овчаренко, В.Д.; Reshetnyak, E.N.; Белоус, В.А.; Василенко, Р.Л.; Tolmachova, G.N.; Kovalenko, V.I.; Klymenko, Ye.V.

doi:10.46813/2019-123-154

Cited by 8 publications

(10 citation statements)

References 22 publications

(10 reference statements)

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“…A set of tungsten coatings was formed using an physical vapor deposition (PVD) method in a "Bulat-6" system equipped with a W (99.9 %) cathode of 60 mm diameter [16]. WN coatings deposited on the substrates of stainless steel 410 AISI.…”

Section: Methodsmentioning

confidence: 99%

Morphology and Sputtering of Tungsten Nitrides Coatings Exposed to Deuterium Plasma

Tolstolutskaya¹,

Куприн²,

Nikitin³

et al. 2023

Problems of Atomic Science and Technology

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Processes of sputtering, surface modification and change in the stoichiometric composition of W and WN coatings deposited on stainless steel by cathodic arc evaporation were studied under the influence of low-energy (500 eV/D) deuterium plasma with fluence of (1…4.5)1024 D2 +/m2 at room temperature. The composition of the WN coating changes under the influence of deuterium plasma, its enrichment with tungsten up to 100 % is observed. Results of erosion studies indicated that the sputtering yields for coatings WN and W are ~ 2.410-2 at./ion and to be systematically higher than the published data which were measured for bulk materials.

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Section: Methodsmentioning

confidence: 99%

Morphology and Sputtering of Tungsten Nitrides Coatings Exposed to Deuterium Plasma

Tolstolutskaya¹,

Куприн²,

Nikitin³

et al. 2023

Problems of Atomic Science and Technology

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“…Tungsten coatings were deposited on tungsten substrates by means of PVD method using unfiltered cathodic arc evaporation in a "Bulat-6" system equipped with a W (99.9%) cathode of 60 mm diameter. Magnetic stabilization of the cathode spot was used in a vacuum-arc plasma source [11]. The main advantage of the cathodic arc evaporation method over conventional magnetron sputtering deposition is a much higher degree of plasma ionization and energy of metallic ions [12.…”

Section: Methodsmentioning

confidence: 99%

Thermodynamic and Kinetic Parameters of the Processes of Deuterium Interaction with Tungsten Protective Coatings

Karpov

Ruzhytskyi

Tolstolutskaya

et al. 2021

EEJP

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The effect of radiation damage on the retention of deuterium in tungsten (W) was examined. A vacuum-arc plasma source with magnetic stabilization of the cathode spot was used for tungsten coatings preparation. W samples were treated with D ions at temperatures 300‑600 K with a fluence of (1 – 10) ·1020 D2+/m2 and ion energies of 12 keV/D2+. The influence of radiation damage on microstructure and accumulation of deuterium implanted in W samples at room temperature and after annealing have been studied. Thermal desorption (TD) spectroscopy was used to determine the D retained throughout the bulk of the sample. The structure of TD spectra represents the multi-stage process of deuterium release suggesting the trapping of gas atoms by a number of defect types. Computational evaluation of deuterium desorption within the framework of the diffusion-trapping model allows to associate characteristics of experimental TD spectra with specific trapping sites in the material. Experimental TD spectrum was fitted by assigning four binding energies of 0.55 eV, 0.74 eV, 1.09 eV and 1.60 eV for the peaks with maxima at 475, 590, 810 and 1140 K, respectively. The low temperature peak in the TD spectra is associated with desorption of deuterium bounded to the low energy natural traps, whereas the other peaks are related to the desorption of deuterium bounded to the high energy ion induced traps: monovacancies and vacancy clusters.

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“…The most intense in these experiments is the superstructure reflection (332), which can be associated both with the texture in the coatings and with the peculiarities of the ordering of the solid solution. For example, TiN coatings with a cubic structure, such as NaCl deposited from high-energy vacuum-arc plasma streams, are characterized by a predominant (220) orientation, which leads to the disappearance of (h00) and (hhh) reflections in the diffractograms [36][37][38]. The peaks detected in the diffractograms of V-O-N coatings are narrower than for V-N and correspond to a crystallite size of about 35 nm.…”

Section: Chemical and Phase Compositionmentioning

confidence: 99%

Mechanical Properties of V-O-N Coatings Synthesized by Cathodic Arc Evaporation

Warcholinski,

Gilewicz,

Kuprin

et al. 2024

Materials

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The V-O-N coating set was produced at different relative oxygen concentrations of O2(x) = O2/(N2 +O2) using cathodic arc evaporation. The aim of the research was to determine the effect of oxygen on coating properties. The coatings’ composition and structural properties (X-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDX)) and mechanical properties—hardness, adhesion, and wear resistance (nano-indenter, scratch tester, ball-on-disc tester)—were extensively investigated. EDX and XRD analyses indicate that in coatings formed with a relative oxygen concentration in the range of 20–30%, the oxygen concentration in the coating increases dramatically from approximately 16 at.%. to 63 at.%, and the nitrogen concentration drops from about 34 at.% up to 3 at.%. This may indicate greater activity of oxygen compared to nitrogen in forming compounds with vanadium. The occurrence of the V5O9 phase belonging to the Magnéli phases was observed. Microscopic observations indicate that the number of surface defects increases with the oxygen concentration in the coating. The opposite effect is characterized by mechanical properties—hardness, adhesion, and wear resistance decrease with increasing oxygen concentration in the coating.

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DEPOSITION OF TiN-BASED COATINGS USING VACUUM ARC PLASMA IN INCREASED NEGATIVE SUBSTRATE BIAS VOLTAGE

Cited by 8 publications

References 22 publications

Morphology and Sputtering of Tungsten Nitrides Coatings Exposed to Deuterium Plasma

Morphology and Sputtering of Tungsten Nitrides Coatings Exposed to Deuterium Plasma

Thermodynamic and Kinetic Parameters of the Processes of Deuterium Interaction with Tungsten Protective Coatings

Mechanical Properties of V-O-N Coatings Synthesized by Cathodic Arc Evaporation

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