DEPOSITION OF TiAlV THIN FILMS BY PULSED LASER AND DC MAGNETRON SPUTTERING: STRUCTURAL, COMPOSITIONAL AND ELECTROCHEMICAL CORROSION STUDY

Abstract

In this work, TiAlV thin films have been prepared on two different types of substrates: silicon and stainless steel (SS304) by two deposition methods: Pulsed Laser Deposition (PLD) and DC magnetron sputtering. Different techniques have been employed in order to characterize film properties such as: Scanning Electron Microscopy (SEM) equipped with Energy Dispersive X-ray (EDX), X-ray diffraction (XRD), microhardness and corrosion test. EDX analysis showed that the deposited films are slightly different from that of the target material Ti6Al4V alloy. The measured microhardness values are about 11.7[Formula: see text]GPa and 4.7[Formula: see text]GPa for films prepared by PLD and DC magnetron sputtering, respectively. Corrosion test indicated that the corrosion resistance of the two TiAlV films deposited on SS304 substrates in (0.9% NaCl) physiological normal saline medium was significantly improved compared with the SS304 substrates. These attractive results could permit applications of our films in the medical implants fabrication.

Investigation of the Structural, Electrical and Corrosion Properties of NbN Films Deposited by Magnetron Sputtering (DC Power Supply) Technique at Different Power

“…The value of Icorr decreases from 17.45 to 6.313 A/cm 2 with increasing power from 100 to 150 W, 06032-4 where a lower current density corresponds to a higher corrosion resistance. We can associate a higher corrosion resistance (of NbN/SS304 at 150 W) with a smaller grain size [6], as well as a higher microhardness [14], so the best corrosion resistance was for a film deposited at 150 W in the Tafel measurement.…”

“…Corrosion of NbN coatings deposited on SS304 substrate (NbN/SS304) was studied using the corrosion potential (Cor. Pot) by the Tafel method [14], polarization resistance, and electrochemical impedance spectroscopy (EIS) techniques [15] by means of Voltalab PGZ 301 (France), where the saline medium was 0.9 % NaCl (equivalent to serum media).…”

“…Magnetron sputtering [8] is frequently used due to its advantages, plasma parameter adjustment [6] and the ability to control thickness [11] with high quality [10], large surface area homogeneity, hardness and corrosion behavior of deposited films [12], but another deposition technique requires heating up to 500 C, such as plasma enhanced chemical vapor deposition (PECVD) [13]. Furthermore, corrosion behavior of thin films is an interesting property for use in industrial and medical fields [14]. Local impact in the form of pits, crevices, intergranular corrosion or cracks can occur largely due to an increase in the film surface roughness.…”

Study of morphological, physical and mechanical properties of thin NbN films synthesized via DC magnetron sputtering system

“…The I corr values are 17.45, 7.31 and 6.313 mA/cm 2 corresponding with 100, 125 and 150 W of power, respectively; the lesser density of current matching with superior corrosion resistance. We can relate the higher resistance (for deposited film at 150 W) with lesser size of grain (Abdallah et al, 2018) and superior microhardness (Alkhawwam et al, 2019), consequently the better resistance of 2 for Tafel analysis.…”

“…(Sánchez et al , 2009). In addition, attractive properties of corrosion behavior thin films have to motivate it in medicinal and industrial (Alkhawwam et al , 2019; Suliman and Aljudy, 2021), increasing roughness of the film surface could lead to focuse in the crevices shape, pits, and intergranular corrosion or cracks (Zhou, 2016). This resistance leads to use the nitride film as protective layer as well as anticorrosion, wear coating in industrial and many domains airspace, automobile and marine transportation operating in seawater; (Abdallah et al , 2019).…”