Deposition of superhard TiAlSiN thin films by cathodic arc plasma deposition

Kim, S.K.; Vinh, Pham Van; Kim, J.H.; Ngoc, Thanh Tran

doi:10.1016/j.surfcoat.2005.08.109

Cited by 77 publications

(24 citation statements)

References 17 publications

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“…A rotating sample holder was located at the center of the chamber. Detailed deposition process conditions are shown in Table 1 and have been described elsewhere [12]. The thickness of all the films was controlled to approximately 1.68 um.…”

Section: Sample Preparationmentioning

confidence: 99%

“…To overcome this problem, aluminium was alloyed to form a TiAlN coating in the 1990s, which significantly improved the hardness and oxidation resistance up to 800°C due to the age hardening effect [4][5][6][7][8]. Recently, with the development of new physical vapor deposition methods such as magnetron sputtering [9,10], hybrid method [11] and cathodic arc method [12,13], much attention has been paid to the incorporation of substitutional elements such as silicon which forms the Ti(Al)N-Si 3 N 4 nanostructures in order to further improve the physical and chemical properties [9]. In this study, TiN, TiAlN and TiAlSiN films were deposited on AISI H13 tool steel substrates by cathodic arc plasma deposition, and the differences in corrosion behavior among these TiN-based hard coatings were investigated.…”

Section: Introductionmentioning

confidence: 99%

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Corrosion behavior of TiN, TiAlN, TiAlSiN thin films deposited on tool steel in the 3.5 wt.% NaCl solution

et al. 2008

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Section: Sample Preparationmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Corrosion behavior of TiN, TiAlN, TiAlSiN thin films deposited on tool steel in the 3.5 wt.% NaCl solution

et al. 2008

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“…It was evidence that an amorphous phase exist in the Ti 49 Al 0 44 Si 0 07 N coating might cause the peak broadening and refining. [9][10] The lattice constant can be calculated from XRD pattern that Ti 0 …”

Section: As-deposited Tialn and Tialsin Filmsmentioning

confidence: 99%

Thermal Stability of TiAlN and Nanocomposite TiAlSiN Thin Films

Yang

Chang²,

Lin³

et al. 2009

J. Nanosci. Nanotech.

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TiAlN and TiAlSiN coatings were synthesized by a cathodic arc deposition process. Titanium, Ti50Al50 alloy and AlSi (88 at.% of Al and 12 at.% of Si) alloy targets were adopted as the cathode materials. X-ray diffraction analyses revealed that Ti0.5Al0.5N and Ti49Al0.44Si0.07N possess a B1-NaCl crystal structure. The lattice constants of the Ti0.5Al0.5N and Ti0.49Al0.44Si0.07N calculated from XRD pattern were 0.418 nm and 0.422 nm, respectively. For the high temperature oxidation test, the coated samples were annealed at 900 degrees C in air atmosphere for 2 hours. In this study, the deposited Ti0.5Al0.5N had completely transformed to TiO2 and Al2O3, and Ti0.49Al0.44Si0.07N remained the as-deposited structure after oxidation treatment. It indicated that Ti0.49Al0.44Si0.07N possesses superior oxidation resistance than Ti0.5Al0.5N, due to the amorphous SiNx phase existed in the nanocomposite structure. The different oxidation mechanisms of Ti50Al50N and Ti0.49Al0.44Si0.07N at high temperature of 900 degrees C are developed in this study.

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“…To improve the oxidation resistance of these films, ternary materials were investigated, such as Ti-Al-N [3,4] and Cr-Al-N [3,5], and they are now widely used in commercial applications. Further increase in the oxidation resistance was achieved by the addition of Si [6][7][8] or combining nitrides of Ti, Al and Cr in quaternary compounds. The latter concept has been found to have promising performance compared to that of ternary films.…”

Section: Introductionmentioning

confidence: 99%