Deposition of stable hydrophobic coatings with in-line CH4 atmospheric rf plasma

Kim, Jeong Hoon; Liu, Guangming; Kim, Seong H.

doi:10.1039/b516329c

Cited by 63 publications

(51 citation statements)

References 23 publications

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“…Figure 3 depicts the voltage-versus-charge plot or the so-called Lissajous figure. As stated before, this Lissajous figure can be used to calculate the electrical power [8], which in this case is equal to 17.4 W.…”

Section: Electrical Characterization Of the Dischargementioning

confidence: 99%

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Increasing the Hydrophobicity of a PP Film Using a Helium/CF4 DBD Treatment at Atmospheric Pressure

Geyter

Morent

Gengembre

et al. 2008

Plasma Chem Plasma Process

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Plasma surface modification is widely used to tailor the surface properties of polymeric materials. Most treatments are performed using low pressure plasma systems, but recently, atmospheric dielectric barrier discharges (DBDs) have appeared as interesting alternatives. Therefore, in this paper, an atmospheric He + CF 4 DBD is used to increase the hydrophobicity of a polypropylene (PP) film. The surface characterization of the PP film is performed using contact angle measurements, X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). Results show that the hydrophobic properties of the polymer films are greatly enhanced after plasma treatment as evidenced by an increased contact angle. The incorporation of fluorine on the surface is significant (45 at%), demonstrating the ability of the used DBD set-up to generate fluorine-containing functional groups on the PP surface.

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Section: Electrical Characterization Of the Dischargementioning

confidence: 99%

“…Among many techniques that can be utilized for this purpose, a plasma-based process is very attractive in many ways [8,9]. Plasma surface modification does not require the use of water and chemicals, so it can be considered as an environmentally benign technology [9].…”

Section: Introductionmentioning

confidence: 99%

Increasing the Hydrophobicity of a PP Film Using a Helium/CF4 DBD Treatment at Atmospheric Pressure

Geyter

Morent

Gengembre

et al. 2008

Plasma Chem Plasma Process

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show abstract

“…However, the use of low pressure plasma polymerisation techniques has important limitations for industrial applications. Some of the disadvantages include the requirement for expensive vacuum pumping systems, the restriction to the use of vacuum compatible materials, low deposition rates and the difficulty to develop continuous processing systems [21][22][23]. As a result of these limitations, nowadays there has been considerable interest in the development of atmospheric pressure non-thermal plasma sources suitable for thin film deposition [21,22,24].…”

Section: Introductionmentioning

confidence: 99%

Deposition of Polyacrylic Acid Films by Means of an Atmospheric Pressure Dielectric Barrier Discharge

Morent

Geyter

Vlierberghe

et al. 2009

Plasma Chem Plasma Process

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The present work describes the plasma polymerisation of acrylic acid at atmospheric pressure. The influence of two operating parameters (monomer concentration and discharge power) on the properties of the deposited films is investigated. Results show that at a monomer concentration of 2.5 ppm and a discharge power of 9.5 W, the monomer is only slightly fragmented leading to a high amount of carboxylic acid groups on the deposited films. In contrast, when monomer concentration is decreased or discharge power increased, the incidence of monomer fragmentation processes is higher, leading to a lower amount of carboxylic acid groups on the films. This behaviour can be explained by a higher energy amount available per monomer molecule at low monomer concentrations and high discharge powers and a higher flux of positive ions attacking the surface at high discharge powers. Taking into account these results, it can be concluded that the deposition parameters should be carefully selected in order to preserve the stability of the monomer and thus obtain coatings with high carboxylic acid densities

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“…The film obtained during the positive corona exhibits peaks at 2958, 2932 and 2872 cm -1 corresponding to CH 3 asymmetric stretch, CH 2 asymmetric stretch and CH 2 symmetric stretch, respectively [46][47][48][49], indicating the higher composition of hydrogen in the hydrocarbon film ( figure 12). For the film obtained during the negative corona discharge, the presence of mainly two peaks at 2918 and 2849 cm -1 in the aliphatic C-H stretching region corresponding to CH 2 asymmetric stretch and CH 2 symmetric stretch, respectively, is indicating the presence of long hydrocarbon polymeric chain in the film [50].…”

Section: Deposited Film Characterizationmentioning

confidence: 99%

Pulsed corona plasma source characterization for film deposition on the inner surface of tubes

Pothiraja¹,

Bibinov²,

Awakowicz³

2010

J. Phys. D: Appl. Phys.

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To cite this version:Ramasamy Pothiraja, Nikita Bibinov, Peter Awakowicz. Pulsed corona plasma source characterization for film deposition on the inner surface of tubes. Journal of Physics D: Applied Physics, IOP Publishing, 2010, 43 (49) Abstract. A microplasma jet has been constructed for chemical vapor deposition on inner surface of narrow long tubes and is tested on a quartz tube with the inner diameter of 6 mm and the outer diameter of 8 mm. A long plasma filament (> 100 mm) is generated inside the tube in argon with methane admixture. Depending on the quantity of admixture in argon, the negative as well as the positive corona discharges are ignited. Both modes of plasma are characterized using optical emission spectroscopy. For this purpose, nitrogen is admixed with argon and its emission is used for the determination of gas temperature, electron velocity distribution function, and electron density at various places along the axis of the tube. The formation of active species, like C, C 2 , CH, etc. during the dissociation of methane, is observed through their characteristic emission. The rate of methane dissociation is determined at various places along the axis of the tube during both modes of discharge. Since the chemical kinetics of film growth process is different, different kinds of films are obtained during different modes of discharge.

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Deposition of stable hydrophobic coatings with in-line CH4 atmospheric rf plasma

Cited by 63 publications

References 23 publications

Increasing the Hydrophobicity of a PP Film Using a Helium/CF4 DBD Treatment at Atmospheric Pressure

Increasing the Hydrophobicity of a PP Film Using a Helium/CF4 DBD Treatment at Atmospheric Pressure

Deposition of Polyacrylic Acid Films by Means of an Atmospheric Pressure Dielectric Barrier Discharge

Pulsed corona plasma source characterization for film deposition on the inner surface of tubes

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