Deposition of SiOx films from O2/HMDSO plasmas

Hegemann, Dirk; Vohrer, U.; Oehr, Christian; Riedel, Ralf

doi:10.1016/s0257-8972(99)00092-4

Cited by 98 publications

(74 citation statements)

References 14 publications

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“…Densities typically range between 1 and 2 g cm −3 depending on the deposition conditions [26]. The density of SiO x obtained for O 2 /HMDSO = 30 is close to that of fused silica (2.2 g cm −3 ) and compares well with densities obtained at similar conditions [10,28].…”

Section: Influence Of the O 2 /Hmdso Ratiosupporting

confidence: 70%

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Oxygen permeation, mechanical and structural properties of multilayer diffusion barrier coatings on polypropylene

Körner¹,

Sonnenfeld²,

Heuberger³

et al. 2010

J. Phys. D: Appl. Phys.

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To improve temperature durability for autoclaving of SiO x diffusion barrier coatings on polypropylene, plasma polymerized hexamethyldisiloxane (pp-HMDSO) is applied by plasma enhanced chemical vapour deposition as interlayer material and compared with results obtained with amorphous hydrogenated carbon-nitrogen (a-C : N : H) and a-Si : C : O : N : H interlayers. The influence of the O 2 /HMDSO ratio on the chemical structure and related mechanical and oxygen barrier properties is investigated by fragmentation tests, dilatometry, oxygen transmission rate, internal stress and mass density measurements as well as Fourier transform infrared and x-ray photoelectron spectroscopy. Carbon-rich, polymer-like coatings with low density, low internal stress and excellent adhesive and cohesive properties are found for pp-HMDSO at the expense of barrier performance. In the SiO x /pp-HMDSO coating a broad transition in chemical composition was observed, explaining improved mechanical properties responsible for good barrier performance after thermal cycling or autoclaving.

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Section: Influence Of the O 2 /Hmdso Ratiosupporting

confidence: 70%

“…At the pp-HMDSO/PP substrate transition a gradual change in composition is observed as well. The thickness of this interphase is related to the substrate roughness [28]. In this case the interphase is rather thin affirming that the surface of the PP foil is smooth (S a < 2 nm).…”

Section: Xps Analysismentioning

confidence: 70%

Oxygen permeation, mechanical and structural properties of multilayer diffusion barrier coatings on polypropylene

Körner¹,

Sonnenfeld²,

Heuberger³

et al. 2010

J. Phys. D: Appl. Phys.

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“…For a maximum peak load of 5 mN, uncovered Cu substrates presented a hardness of 2.3 GPa, while typical values for PECVD-treated substrates were 4.6 GPa, similar values, to a good extent, to those reported under similar conditions for silica films deposited by PECVD from O 2 -containing plasmas. [10,31,32] These results suggest the possibility of obtaining protective films with good mechanical properties, even when avoiding the use of oxidizing atmospheres during the preparation process.…”

Section: Resultsmentioning

confidence: 98%

“…These results appear of great importance for application of the synthesized films as protective coatings. In fact, while Si-H bonds, frequently detected when silane precursors are used, lead to softer and less dense films, [10,18] Si-OH moieties reduce the corrosion resistance and the chemical and mechanical stability of the coatings, since they are known to adsorb water and to decrease the material hardness. [8,9,25] In order to further corroborate FTIR results, the synthesized specimens were also analyzed using XPS, focusing on both their surface and in-depth chemical composition.…”

Section: Resultsmentioning

confidence: 99%

“…In particular, high deposition temperatures and/or oxidizing atmospheres have to be avoided in the deposition of protective coatings against oxidation of polymeric or metallic substrates. [10] On this basis, PECVD represents a preferred choice among the various liquid-and vapor-phase routes, thanks to the low temperature deposition of such materials at appreciable growth rates, and the possibility of obtaining homogeneous coatings and also sharp interfaces on complexly shaped substrates. [4,5,10,[12][13][14][15][16][17] Nevertheless, conventional processes involving the use of SiH 4 as a precursor suffer from several disadvantages.…”

Section: Introductionmentioning

confidence: 99%

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Low‐Temperature PECVD of Transparent SiO_xC_yH_z Thin Films

Barreca

Gasparotto

Maccato

et al. 2007

Chemical Vapor Deposition

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Hybrid organic/inorganic SiO x C y H z thin films are prepared on Cu, Si(100), and SiO 2 substrates by plasma-enhanced (PE)CVD using tetramethoxysilane (TMOS) as the precursor compound. Depositions are performed from Ar plasmas at temperatures as low as 60°C, avoiding the use of oxidizing reagents in view of possible film application as protective coatings against substrate oxidation. In situ monitoring of deposition processes is performed using laser reflection interferometry (LRI), which provides valuable information on the growth rate as a function of the adopted synthesis conditions. The obtained film thickness values are confirmed by scanning electron microscopy (SEM), which is also used to investigate the film morphology and its adhesion to the substrate. The chemical structure and composition are investigated in detail by a combined use of energy dispersive X-ray spectroscopy (EDX), Fourier transform infrared (FTIR) spectroscopy, and X-ray photoelectron spectroscopy (XPS). Glancing incidence X-ray diffraction (GIXRD) and UV-vis spectroscopy are used for the study of the structural and optical properties of the system. Finally, nanoindentation measurements permit the evaluation of the hardness of the synthesized coatings. Amorphous layers with a silica-like network incorporating covalently bonded methyl and methoxy groups are obtained under very mild synthesis conditions. Furthermore, the coatings are characterized by good substrate conformal coverage and remarkable optical transparency.

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Charakterisierung plasma- modifizierter Polymere mittels SSXPS und XPS-Imaging

Vohrer¹,

Hegemann²,

Oehr³

et al. 2000

VIP

Self Cite

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Polymere Werkstoffe mit maßgeschneiderten Oberflächeneigenschaften stehen seit vielen Jahren im Mittelpunkt der Forschung und Entwicklung. Eine häufig genutzte Technik zur Funktionalisierung und Beschichtung von Polymeren stellt dabei die Plasmatechnik dar. Ausschlaggebend dafür ist, dass mit diesem Verfahren Kunststoffe, die nasschemisch nur schwer oder gar nicht zu modifizieren sind, ohne Beeinträchtigung der gewünschten Volumeneigenschaften gezielt an der Oberfläche funktionalisiert bzw. haftfest beschichtet werden können. Der Einsatz technischer Polymere im Bereich Medizintechnik, life‐science und Biotechnologie fordert zudem monofunktionalisierte und strukturierte Oberflächen, die ebenfalls durch geeignete Prozeßführung generiert werden können. Zur Charakterisierung dieser maßgeschneiderten Oberflächen stehen verschiedene analytische Verfahren zur Verfügung. Neben AFM und FTIR kommt hier vor allem auch die Röntgenfotoelektronenspektroskopie (XPS, ESCA) zum Einsatz.

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Deposition of SiOx films from O2/HMDSO plasmas

Cited by 98 publications

References 14 publications

Oxygen permeation, mechanical and structural properties of multilayer diffusion barrier coatings on polypropylene

Oxygen permeation, mechanical and structural properties of multilayer diffusion barrier coatings on polypropylene

Low‐Temperature PECVD of Transparent SiO_xC_yH_z Thin Films

Charakterisierung plasma- modifizierter Polymere mittels SSXPS und XPS-Imaging

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Deposition of SiOx films from O2/HMDSO plasmas

Cited by 98 publications

References 14 publications

Oxygen permeation, mechanical and structural properties of multilayer diffusion barrier coatings on polypropylene

Oxygen permeation, mechanical and structural properties of multilayer diffusion barrier coatings on polypropylene

Low‐Temperature PECVD of Transparent SiOxCyHz Thin Films

Charakterisierung plasma- modifizierter Polymere mittels SSXPS und XPS-Imaging

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Low‐Temperature PECVD of Transparent SiO_xC_yH_z Thin Films