2020
DOI: 10.1109/tps.2020.3029865
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Deposition of SiO2 and TiO2 Films on Electrode Materials to Suppress Space Charge Injection

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Cited by 7 publications
(1 citation statement)
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“…Cui Chaochao et al used the atmospheric pressure plasma jet to treat the copper surface and found that when the thickness of the deposited TiO 2 film was 349 nm, the work function increased from 4.65 to 4.87 eV and the maximum field strength near the defect was also reduced [14,15]. At present, metal surface coating technology has been widely studied [16][17][18], which provides an important reference for the study of using coating technology to improve insulation performance in electrical equipment.…”
Section: Introductionmentioning
confidence: 99%
“…Cui Chaochao et al used the atmospheric pressure plasma jet to treat the copper surface and found that when the thickness of the deposited TiO 2 film was 349 nm, the work function increased from 4.65 to 4.87 eV and the maximum field strength near the defect was also reduced [14,15]. At present, metal surface coating technology has been widely studied [16][17][18], which provides an important reference for the study of using coating technology to improve insulation performance in electrical equipment.…”
Section: Introductionmentioning
confidence: 99%