Deposition of Silicon Dioxide Thin Film by Means of “Cold Atmospheric Pressure Plasma Torch (CAPPLAT)”

優, 池田; 七五三木, 喬; 真一, 黒田

doi:10.1295/koron.66.97

Cited by 3 publications

(2 citation statements)

References 12 publications

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“…[13][14][15][16] Silicon oxide-based films were synthesized by APGD in helium or APTD in nitrogen with an admixture of organosilicon compounds, such as hexamethyldisiloxane (HMDSO) or tetraethoxysilane (TEOS). Ikeda et al 22 succeeded in achieving low-temperature deposition of SiO 2 films using the atmospheric pressure plasma jet from tetramethoxysilane (TMOS), which has a low content of carbon atoms per molecule compared to HMDSO or TEOS. In our previous research, SiOC(ÀH) films deposited from trimethylsilane exhibited a) Present address: TOTO LTD., Japan; electronic mail: okura0306@ gmail.com about 1 GPa, which is much softer than the films deposited by conventional low-pressure PECVD.…”

Section: Introductionmentioning

confidence: 99%

Abrasion resistance of silica-based coatings prepared by atmospheric pressure plasma chemical vapor deposition for protection of polymeric surfaces

Noborisaka

Mori

Horikoshi

et al. 2013

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Articles you may be interested inLow temperature direct bonding mechanisms of tetraethyl orthosilicate based silicon oxide films deposited by plasma enhanced chemical vapor deposition Influence of temperature on the hydrogenated amorphous carbon films prepared by plasma-enhanced chemical vapor deposition Influence of thermal budget on phosphosilicate glass prepared by high-density plasma chemical-vapor deposition J. Vac. Sci. Technol. B 23, 2146 (2005); 10.1116/1.2050670High-rate deposition of abrasion resistant coatings using a dual-source expanding thermal plasma reactor Silica-based films were synthesized by the dielectric barrier discharge method under atmospheric pressure from tetramethoxysilane and O 2 diluted with N 2 . In this study, the coating area was 200 mm in diameter, which could be enlarged by altering shape of the electrodes and expanding the scanning range. Even at the low temperature of 80 C, the hardness of the films slightly increased up to 4.3 GPa by decreasing the tetramethoxysilane flow rate. The relative ratio of SiÀOÀSi (cage structure) bonds to SiÀOÀSi (network structure) decreased, and as a result, the films became harder. Additionally, it was found that silica-based films deposited on acrylic resin-coated polycarbonate substrates had good abrasion resistance; the minimum DHz value after 1000 revolutions in the Taber abrasion tests was 2.5%. These results suggest that the silica-based films synthesized under atmospheric pressure have the potential to be used in mass production because the equipment enables low-cost and large-area synthesis. The authors find that there is potential in using atmospheric pressure plasma technology for the automobile industry.

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Section: Introductionmentioning

confidence: 99%

Abrasion resistance of silica-based coatings prepared by atmospheric pressure plasma chemical vapor deposition for protection of polymeric surfaces

Noborisaka

Mori

Horikoshi

et al. 2013

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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“…We developed an original Cold Atmospheric Pressure Plasma Torch (CAPPLAT), and have been studied its application to film deposition technology [10,11]. As a part of such efforts, we studied a-C:H coating on rubber surface using the CAPPLAT.…”

Section: Introductionmentioning

confidence: 99%

Friction Characteristics of Amorphous Carbon Films on Rubber Deposited by Cold Atmospheric Pressure Plasma

Mizote

Kuroda

2012

Tribology Online

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Hydrogenated amorphous carbon (a-C:H) films were deposited on rubber surface by plasma-enhanced chemical vapor deposition (CVD), using a non-equilibrium atmospheric pressure plasma torch. The effects of oxygen, in the deposition atmosphere, on the chemical and mechanical characteristics of a-C:H films were investigated. It was clarified that the amount of carbon atoms combined with oxygen atoms in the a-C:H films increased with the increase of the oxygen content in the deposition atmosphere. On the other hand, surface hardness decreased as the oxygen content increased. As a result, a very low frictional property of a-C:H films was achieved by CVD, using the non-equilibrium atmospheric pressure plasma torch with eliminating oxygen from the deposition atmosphere.

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High Adhesion of Hot-Dip Galvanized Steel and Silicone Adhesive through Si Amorphous Film

Tsuyuki,

Niiyama,

Haruna

et al. 2024

Journal of Japan Institute of Electronics Packaging

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Deposition of Silicon Dioxide Thin Film by Means of “Cold Atmospheric Pressure Plasma Torch (CAPPLAT)”

Cited by 3 publications

References 12 publications

Abrasion resistance of silica-based coatings prepared by atmospheric pressure plasma chemical vapor deposition for protection of polymeric surfaces

Abrasion resistance of silica-based coatings prepared by atmospheric pressure plasma chemical vapor deposition for protection of polymeric surfaces

Friction Characteristics of Amorphous Carbon Films on Rubber Deposited by Cold Atmospheric Pressure Plasma

High Adhesion of Hot-Dip Galvanized Steel and Silicone Adhesive through Si Amorphous Film

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