Deposition of Polytetrafluoroethylene Film Assisted by Synchrotron Radiation Irradiation

Abstract

A novel process was developed for fabricating a polytetrafluoroethylene (PTFE) thin film using synchrotron radiation (SR). First, a PTFE substrate was exposed to high-energy X-rays (2-8 keV) at room temperature. Afterwards, the PTFE substrate (target) was heated under atmospheric pressure and fragments desorbed from the surface deposited on a glass substrate to produce a film with a thickness of above 10 µm. The characterization of the chemical structure of the deposited film was carried out using X-ray diffraction (XRD). The results indicated that the crystalline structure of the film became closer to those of the PTFE substrate upon an increase in the X-ray irradiation of the sample. The fabrication process of this PTFE thin film could be applied to various fields because surface modification of the substrate can be easily carried out.

Molecular Structure Evaluation of Bulk Polytetrafluoroethylene Modified by X-ray Irradiation

“…On the other hand, we have carried out research regarding the photochemical reaction between Xray of several keV and PTFE [12][13][14][15][16][17]. The X-rays can penetrate PTFE surface to a depth of around 300 µm and induce interaction with PTFE molecular.…”